公开(公告)号：US20220198981A1

公开(公告)日：2022-06-23

申请号：US17553271

申请日：2021-12-16

申请人： TOKYO ELECTRON LIMITED

发明人： Megumi JOHSAKA ,  Hiroshi TOMITA ,  Takuya MORI ,  Hideki UCHIGAKI

IPC分类号： G09G3/20 ,  C23C16/52

摘要： A display device for displaying information about substrate processing executed in a substrate processing apparatus, includes: a display control part configured to, in response to a first instruction from a user, allow the display screen to display a first image based on first capturing data obtained by capturing an image of a display target substrate among the substrates in the substrate processing apparatus, and configured to, in response to a second instruction from the user, allow the display screen to display a second image based on second capturing data obtained by capturing the image of the display target substrate in the substrate processing apparatus, wherein the first capturing data is obtained by capturing the image of the display target substrate at a different timing from the second capturing data, or by capturing the image of the display target substrate in a different capturing region from the second capturing data.

公开(公告)号：US20180156739A1

公开(公告)日：2018-06-07

申请号：US15577354

申请日：2016-05-13

申请人： Tokyo Electron Limited

发明人： Takuya MORI ,  Makoto HAYAKAWA

IPC分类号： G01N21/956 ,  G01N21/95 ,  H01L21/67

CPC分类号： G01N21/956 ,  G01N21/9501 ,  H01L21/6715 ,  H01L21/67173 ,  H01L21/67178 ,  H01L21/67253 ,  H01L21/67288 ,  H01L21/67742

摘要： A method of inspecting a substrate to be repeatedly treated along a predetermined transfer way in a plurality of kinds of different treatment apparatuses, includes: imaging a substrate that has been treated in one of the treatment apparatuses, to acquire a first substrate image; imaging a substrate that has been an object for imaging the first substrate image and further treated in another treatment apparatus different from the one treatment apparatus after treated in the one treatment apparatus, to acquire a second substrate image; then performing defect inspection, based on the first substrate image and the second substrate image; and identifying, depending on whether or not a defect detected from the second substrate image is not detected from the first substrate image, whether or not the defect is caused by a treatment after the first substrate image is acquired and a treatment before the second substrate image is acquired.

公开(公告)号：US20200088654A1

公开(公告)日：2020-03-19

申请号：US16689218

申请日：2019-11-20

申请人： Tokyo Electron Limited

发明人： Takuya MORI ,  Makoto HAYAKAWA

IPC分类号： G01N21/956 ,  G03F7/20 ,  G03F1/84 ,  G01N21/95 ,  H01L21/66

摘要： A substrate inspection method in a substrate treatment system including a plurality of treatment apparatuses each performing a predetermined treatment on a substrate, includes: imaging a surface of a substrate before being treated in the treatment apparatuses to acquire a first substrate image; extracting a predetermined feature amount from the first substrate image; selecting an inspection recipe corresponding to the feature amount extracted from the first substrate image, from a storage unit in which a plurality of inspection recipes each set corresponding to the feature amount in a different range are stored; imaging the surface of the substrate after being treated in the treatment apparatuses to acquire a second substrate image; and determining presence or absence of a defect of the substrate, based on the selected inspection recipe and the second substrate image.

公开(公告)号：US20180143144A1

公开(公告)日：2018-05-24

申请号：US15567997

申请日：2016-05-09

申请人： Tokyo Electron Limited

发明人： Takuya MORI ,  Makoto HAYAKAWA

IPC分类号： G01N21/956 ,  G01N21/95 ,  G03F7/20 ,  G03F1/84

摘要： A substrate inspection method in a substrate treatment system including a plurality of treatment apparatuses each performing a predetermined treatment on a substrate, includes: imaging a surface of a substrate before being treated in the treatment apparatuses to acquire a first substrate image; extracting a predetermined feature amount from the first substrate image; selecting an inspection recipe corresponding to the feature amount extracted from the first substrate image, from a storage unit in which a plurality of inspection recipes each set corresponding to the feature amount in a different range are stored; imaging the surface of the substrate after being treated in the treatment apparatuses to acquire a second substrate image; and determining presence or absence of a defect of the substrate, based on the selected inspection recipe and the second substrate image.

公开(公告)号：US20170032983A1

公开(公告)日：2017-02-02

申请号：US15220653

申请日：2016-07-27

申请人： TOKYO ELECTRON LIMITED

发明人： Koshi MUTA ,  Tsuyoshi MORIYA ,  Takuya MORI ,  Kazuhiro TAKESHITA ,  Tomonori ESAKI ,  Kouichi MIZUNAGA ,  Masataka TANAKA ,  Kouzou KANAGAWA ,  Keigo NAKANO

IPC分类号： H01L21/67 ,  G03F7/16

CPC分类号： G03F7/16 ,  G03F7/168 ,  H01L21/67103 ,  H01L21/67109 ,  H01L21/67115 ,  H01L21/6719 ,  H01L21/67748

摘要： A thermal catalytic layer is formed on the inner surface of a processing container and heated. Thus, when a sublimate sublimated from a coating film on a wafer W and received within the processing container reaches the vicinity of the thermal catalytic layer, the sublimate is decomposed and removed by the thermal activation of the thermal catalytic layer. In removing a sublimate attached to a light transmission window, a cleaning substrate formed with the thermal catalytic layer on the surface thereof is carried into the processing container and caused to approach the light transmission window. Thereafter, the cleaning substrate is heated so that the sublimate attached to the surface of the light transmission window is removed.

摘要翻译： 在处理容器的内表面上形成热催化剂层并加热。 因此，当从晶片W上的涂膜升华并接收在处理容器内的升华达到热催化层附近时，通过热催化层的热活化来分解和去除升华。 在移除附着在透光窗口上的升华中，在其表面上形成有热催化层的清洁基板被运送到处理容器中并使其接近透光窗。 此后，加热清洁基板，使得附着在透光窗的表面上的升华被去除。

公开(公告)号：US20210327045A1

公开(公告)日：2021-10-21

申请号：US17223349

申请日：2021-04-06

申请人： Tokyo Electron Limited

发明人： Tsuyoshi MORIYA ,  Yoshitaka ENOKI ,  Tokio TOYAMA ,  Michihiro TAKAHASHI ,  Takuya MORI

IPC分类号： G06T7/00 ,  G06T11/00 ,  G06T7/70

摘要： A contaminant detection system includes a light source configured to emit excitation light on an object to be inspected; a detector configured to detect fluorescence emitted from a contaminant adhering to the object to be inspected; and a processor. The fluorescence is caused by emission of the excitation light from the light source onto the object to be inspected. The processor is configured to perform a determination of a location of the contaminant and a type of the contaminant, based on the fluorescence emitted from the contaminant; and output a result of the determination.

公开(公告)号：US20180164700A1

公开(公告)日：2018-06-14

申请号：US15891525

申请日：2018-02-08

申请人： Tokyo Electron Limited

发明人： Takuya MORI ,  Masaru TOMONO

IPC分类号： G03F7/20 ,  H01L21/66 ,  H01L21/677 ,  H01L21/67

CPC分类号： G03F7/70633 ,  G03F7/70541 ,  G03F7/7075 ,  G03F7/70991 ,  H01L21/67178 ,  H01L21/67207 ,  H01L21/67745 ,  H01L22/12

摘要： A substrate treatment system includes: a treatment station including a plurality of treatment apparatuses; an interface station which delivers a substrate to/from an exposure apparatus provided outside the system and including a plurality of exposure stages; a plurality of substrate inspection apparatuses; a substrate transfer mechanism which transfers the substrate between each of the treatment apparatuses in the treatment station and the substrate inspection apparatus; and a control apparatus which identifies an exposure stage which has been used in exposure processing of a substrate from among the plurality of exposure stages, and controls the substrate transfer mechanism to transfer the substrate after the exposure processing to a substrate inspection apparatus previously made to correspond to the identified exposure stage.

公开(公告)号：US20160320713A1

公开(公告)日：2016-11-03

申请号：US15105132

申请日：2014-10-30

申请人： TOKYO ELECTRON LIMITED

发明人： Takuya MORI ,  Masaru TOMONO

IPC分类号： G03F7/20 ,  H01L21/67 ,  H01L21/66 ,  H01L21/677

CPC分类号： G03F7/70633 ,  G03F7/70541 ,  G03F7/7075 ,  G03F7/70991 ,  H01L21/67178 ,  H01L21/67207 ,  H01L21/67745 ,  H01L22/12

摘要： A substrate treatment system includes: a treatment station including a plurality of treatment apparatuses; an interface station which delivers a substrate to/from an exposure apparatus provided outside the system and including a plurality of exposure stages; a plurality of substrate inspection apparatuses; a substrate transfer mechanism which transfers the substrate between each of the treatment apparatuses in the treatment station and the substrate inspection apparatus; and a control apparatus which identifies an exposure stage which has been used in exposure processing of a substrate from among the plurality of exposure stages, and controls the substrate transfer mechanism to transfer the substrate after the exposure processing to a substrate inspection apparatus previously made to correspond to the identified exposure stage.

摘要翻译： 基板处理系统包括：处理台，包括多个处理装置; 接口站，其向设置在系统外部并包括多个曝光阶段的曝光装置传送基板; 多个基板检查装置; 在处理站和基板检查装置的各处理装置之间传送基板的基板搬送机构; 以及控制装置，其从多个曝光阶段中识别已经用于基板的曝光处理的曝光阶段，并且控制所述基板转印机构将所述曝光处理之后的所述基板转印到先前对应的基板检查装置 到确定的暴露阶段。