Invention Application
- Patent Title: Radiation Source
- Patent Title (中): 辐射源
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Application No.: US15112602Application Date: 2014-12-19
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Publication No.: US20160334711A1Publication Date: 2016-11-17
- Inventor: Markus Franciscus Antonius EURLINGS , Niek Antonius Jacobus Maria KLEEMANS , Antonius Johannes Josephus VAN DIJSSELDONK , Ramon Mark HOFSTRA , Oscar Franciscus Jozephus NOORDMAN , Tien Nang PHAM , Jan Bernard Plechelmus VAN SCHOOT , Jiun-Cheng WANG , Kevin Weimin ZHANG
- Applicant: ASML NETHERLANDS B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Priority: EP14152630.1 20140127
- International Application: PCT/EP2014/078631 WO 20141219
- Main IPC: G03F7/20
- IPC: G03F7/20 ; G02B19/00 ; H05G2/00

Abstract:
A faceted reflector (32, 32″) for receiving an incident radiation beam (2) and directing a reflected radiation beam at a target. The faceted reflector comprises a plurality of facets, each of the plurality of facets comprising a reflective surface. The reflective surfaces of each of a first subset of the plurality of facets define respective parts of a first continuous surface and are arranged to reflect respective first portions of the incident radiation beam in a first direction to provide a first portion of the reflected radiation beam. The reflective surfaces of each of a second subset of the plurality of facets define respective parts of a second continuous surface and are arranged to reflect respective second portions of the incident radiation beam in a second direction to provide a second portion of the reflected radiation beam.
Public/Granted literature
- US09835950B2 Radiation source Public/Granted day:2017-12-05
Information query
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