公开(公告)号：US20180031979A1

公开(公告)日：2018-02-01

申请号：US15550855

申请日：2016-01-21

申请人： ASML Netherlands B.V.

发明人： Arno Jan BLEEKER ,  Ramon Mark HOFSTRA ,  Erik Petrus BUURMAN ,  Johannes Hubertus Josephina MOORS ,  Alexander Matthijs STRUYCKEN ,  Harm-Jan VOORMA ,  Sumant Sukdew Ramanujan OEMRAWSINGH ,  Markus Franciscus Antonius EURLINGS ,  Peter Frans Maria MUYS

IPC分类号： G03F7/20 ,  H01S3/23 ,  H01S3/00 ,  H05G2/00 ,  G02B27/14

CPC分类号： G03F7/70033 ,  G02B27/141 ,  G03F7/70025 ,  G03F7/70566 ,  H01S3/0064 ,  H01S3/2308 ,  H01S3/2316 ,  H05G2/005 ,  H05G2/008

摘要： A laser radiation source for a lithographic tool comprising a laser module to emit a first laser beam having a first wavelength and a second laser beam having a second wavelength, a beam separation device to separate the optical paths of the first and second laser beams and substantially recombine the optical paths, a beam delivery system to direct the first and second laser beams to a fuel target and an optical isolation apparatus to: adjust the polarization state of the first laser beam, adjust the polarization state of the second laser beam and to block radiation having the adjusted polarization states such that the reflection of the first laser beam and the reflection of the second laser beam are substantially blocked from propagating towards the laser module.

公开(公告)号：US20170315450A1

公开(公告)日：2017-11-02

申请号：US15653380

申请日：2017-07-18

申请人： ASML NETHERLANDS B.V.

发明人： Heine Melle MULDER ,  Johannes Jacobus Matheus BASELMANS ,  Adrianus Franciscus Petrus ENGELEN ,  Markus Franciscus Antonius EURLINGS ,  Hendrikus Robertus Marie VAN GREEVENBROEK ,  Paul VAN DER VEEN ,  Patricius Aloysius Jacobus TINNEMANS ,  Wilfred Edward ENDENDIJK

IPC分类号： G03F7/20

CPC分类号： G03F7/70058 ,  G03F7/70116 ,  G03F7/702 ,  G03F7/70216

摘要： A device manufacturing method includes conditioning a beam of radiation using an illumination system. The conditioning includes controlling an array of individually controllable elements and associated optical components of the illumination system to convert the radiation beam into a desired illumination mode, the controlling including allocating different individually controllable elements to different parts of the illumination mode in accordance with an allocation scheme, the allocation scheme selected to provide a desired modification of one or more properties of the illumination mode, the radiation beam or both. The method also includes patterning the radiation beam having the desired illumination mode with a pattern in its cross-section to form a patterned beam of radiation, and projecting the patterned radiation beam onto a target portion of a substrate.

公开(公告)号：US20170248794A1

公开(公告)日：2017-08-31

申请号：US15439856

申请日：2017-02-22

申请人： ASML Netherlands B.V. ,  ASML Holding N.V.

发明人： Markus Franciscus Antonius EURLINGS ,  Armand Eugene Albert Koolen ,  Teunis Willem Tukker ,  Johannes Matheus Marie De Wit ,  Stanislav Smirnov

IPC分类号： G02B27/09 ,  G03F7/20 ,  G01N21/49 ,  G01B11/27 ,  G01N21/88

CPC分类号： G02B27/0988 ,  G01B11/272 ,  G01N21/49 ,  G01N21/8806 ,  G01N2201/0631 ,  G02B6/0008 ,  G02B26/008 ,  G02B27/0927 ,  G02B27/0994 ,  G03F7/70075 ,  G03F7/70191 ,  G03F7/70616 ,  G03F7/70633

摘要： A beam homogenizer for homogenizing a beam of radiation and an illumination system and metrology apparatus comprising such a beam homogenizer as provided. The beam homogenizer comprises a filter system having a controllable radial absorption profile and configured to output a filtered beam and an optical mixing element configured to homogenize the filtered beam. The filter system may be configured to homogenize the angular beam profile radially and said optical mixing element may be configured to homogenize the angular beam profile azimuthally.

公开(公告)号：US20190155172A1

公开(公告)日：2019-05-23

申请号：US16313816

申请日：2017-06-16

申请人： ASML Holding N.V. ,  ASML Netherlands B.V.

发明人： Yevgeniy Konstantinovich SHMAREV ,  Markus Franciscus Antonius EURLINGS

IPC分类号： G03F7/20 ,  G01N21/47 ,  G01N21/956

CPC分类号： G03F7/70625 ,  G01N21/47 ,  G01N21/956 ,  G02B5/005 ,  G02B26/0833 ,  G02B27/283 ,  G03F7/70633

摘要： An illumination system for a metrology apparatus that can achieve illumination spatial profile flexibility, high polarization extinction ratio, and high contrast. The illumination system includes a polarizing beam splitter (PBS), an illumination mode selector (IMS), and a reflective spatial light modulator (SLM). The PBS divides an illumination beam into sub-beams. The IMS has a plurality of apertures that transmits at least one sub-beam and may be arranged in multiple illumination positions corresponding to illumination modes. A pixel array of the reflective SLM and reflects a portion of the sub-beam transmitted by the IMS back to the IMS and PBS. The PBS, IMS, SLM collectively generates a complex amplitude or intensity spatial profile of the transmitted sub-beam.

公开(公告)号：US20160334711A1

公开(公告)日：2016-11-17

申请号：US15112602

申请日：2014-12-19

申请人： ASML NETHERLANDS B.V.

发明人： Markus Franciscus Antonius EURLINGS ,  Niek Antonius Jacobus Maria KLEEMANS ,  Antonius Johannes Josephus VAN DIJSSELDONK ,  Ramon Mark HOFSTRA ,  Oscar Franciscus Jozephus NOORDMAN ,  Tien Nang PHAM ,  Jan Bernard Plechelmus VAN SCHOOT ,  Jiun-Cheng WANG ,  Kevin Weimin ZHANG

IPC分类号： G03F7/20 ,  G02B19/00 ,  H05G2/00

CPC分类号： G03F7/70091 ,  G02B19/0019 ,  G02B27/0905 ,  G02B27/0983 ,  G03F7/70033 ,  G03F7/70175 ,  H05G2/005 ,  H05G2/008

摘要： A faceted reflector (32, 32″) for receiving an incident radiation beam (2) and directing a reflected radiation beam at a target. The faceted reflector comprises a plurality of facets, each of the plurality of facets comprising a reflective surface. The reflective surfaces of each of a first subset of the plurality of facets define respective parts of a first continuous surface and are arranged to reflect respective first portions of the incident radiation beam in a first direction to provide a first portion of the reflected radiation beam. The reflective surfaces of each of a second subset of the plurality of facets define respective parts of a second continuous surface and are arranged to reflect respective second portions of the incident radiation beam in a second direction to provide a second portion of the reflected radiation beam.

摘要翻译： 用于接收入射辐射束（2）并将反射的辐射束引导到目标的小面反射器（32,32“）。 小面反射器包括多个小平面，多个小面中的每个小面包括反射表面。 多个小平面的第一子集中的每一个的反射表面限定第一连续表面的相应部分，并且被布置成在第一方向上反射入射辐射束的相应第一部分以提供反射辐射束的第一部分。 多个小平面的第二子集中的每一个的反射表面限定第二连续表面的相应部分，并且被布置成在第二方向上反射入射辐射束的相应第二部分以提供反射辐射束的第二部分。

公开(公告)号：US20160116848A1

公开(公告)日：2016-04-28

申请号：US14988944

申请日：2016-01-06

申请人： ASML NETHERLANDS B.V.

发明人： Heine Melle MULDER ,  Johannes Jacobus Matheus BASELMANS ,  Adrianus Franciscus Petrus ENGELEN ,  Markus Franciscus Antonius EURLINGS ,  Hendrikus Robertus Marie VAN GREEVENBROEK ,  Paul VAN DER VEEN ,  Patricius Aloysius Jacobus TINNEMANS ,  Wilfred Edward ENDENDIJK

IPC分类号： G03F7/20

CPC分类号： G03F7/70058 ,  G03F7/70116 ,  G03F7/702 ,  G03F7/70216

摘要： A device manufacturing method includes conditioning a beam of radiation using an illumination system. The conditioning includes controlling an array of individually controllable elements and associated optical components of the illumination system to convert the radiation beam into a desired illumination mode, the controlling including allocating different individually controllable elements to different parts of the illumination mode in accordance with an allocation scheme, the allocation scheme selected to provide a desired modification of one or more properties of the illumination mode, the radiation beam or both. The method also includes patterning the radiation beam having the desired illumination mode with a pattern in its cross-section to form a patterned beam of radiation, and projecting the patterned radiation beam onto a target portion of a substrate.

摘要翻译： 装置制造方法包括使用照明系统来调节辐射束。 调节包括控制照明系统的独立可控元件阵列和相关联的光学部件，以将辐射束转换成期望的照明模式，该控制包括根据分配方案将不同的单独可控元件分配到照明模式的不同部分 ，所述分配方案被选择以提供照明模式，辐射束或两者的一个或多个属性的期望修改。 该方法还包括以具有图案的横截面图案化具有所需照明模式的辐射束，以形成图案化的辐射束，并将图案化的辐射束投射到基板的目标部分上。