Invention Application
- Patent Title: ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE RESIN COMPOSITION, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE
- Patent Title (中): 主动感光或辐射敏感性树脂组合物，图案形成方法，制造电子设备的方法和电子设备
-
Application No.: US15234489Application Date: 2016-08-11
-
Publication No.: US20160347897A1Publication Date: 2016-12-01
- Inventor: Akiyoshi GOTO , Masafumi KOJIMA , Michihiro SHIRAKAWA , Keita KATO , Keiyu OU
- Applicant: FUJIFILM Corporation
- Applicant Address: JP Tokyo
- Assignee: FUJIFILM Corporation
- Current Assignee: FUJIFILM Corporation
- Current Assignee Address: JP Tokyo
- Priority: JP2014-045583 20140307
- Main IPC: C08F224/00
- IPC: C08F224/00 ; G03F7/32 ; G03F7/20 ; C08F220/68 ; G03F7/038
Abstract:
The actinic ray-sensitive or radiation-sensitive resin composition of the present invention contains a resin (P) including a repeating unit (i) having a group which decomposes by the action of an acid represented by the following General Formula (1), a pattern forming method using the composition, a method for manufacturing an electronic device, and an electronic device.
Public/Granted literature
Information query
IPC分类:
