公开(公告)号：US20240152049A1

公开(公告)日：2024-05-09

申请号：US18392802

申请日：2023-12-21

申请人： FUJIFILM Corporation

发明人： Masafumi KOJIMA ,  Yosuke BEKKI ,  Nobuhiro HIURA

IPC分类号： G03F7/004 ,  G03F7/20 ,  G03F7/32

CPC分类号： G03F7/0045 ,  G03F7/2004 ,  G03F7/325

摘要： Provided is an actinic ray-sensitive or radiation-sensitive resin composition that can provide a pattern having good cross-sectional rectangularity. The actinic ray-sensitive or radiation-sensitive resin composition includes: a resin having a group that is decomposed by the action of an acid to generate a polar group; an onium salt (I) that generates an acid represented by formula (1) upon irradiation with actinic rays or radiation; and an onium salt (II) having at least one structural moiety W that includes an anionic moiety A and a cationic moiety M and forms an acidic moiety represented by HA upon irradiation with the actinic rays or radiation. The acid dissociation constant derived from the acidic moiety represented by HA and formed by replacing the cationic moiety in the structural moiety W with H+ is larger than the acid dissociation constant of the acid represented by formula (1).

公开(公告)号：US20230043143A1

公开(公告)日：2023-02-09

申请号：US17896712

申请日：2022-08-26

申请人： FUJIFILM Corporation

发明人： Aina USHIYAMA ,  Masafumi KOJIMA ,  Akiyoshi GOTO ,  Michihiro SHIRAKAWA

IPC分类号： G03F7/029 ,  G03F7/30

摘要： An actinic ray-sensitive or radiation-sensitive resin composition includes a salt including a sulfonium cation having an aryl group substituted with an acid-decomposable group-containing group and having at least three fluorine atoms; and a resin having a polarity that increases through decomposition by an action of an acid, in which the acid-decomposable group-containing group includes a group having a polarity that increases through decomposition by an action of an acid, and the acid-decomposable group-containing group includes no fluorine atom.

公开(公告)号：US20220082938A1

公开(公告)日：2022-03-17

申请号：US17536085

申请日：2021-11-28

申请人： FUJIFILM Corporation

发明人： Aina USHIYAMA ,  Masafumi KOJIMA ,  Akiyoshi GOTO ,  Michihiro SHIRAKAWA ,  Keita KATO ,  Hironori OKA

IPC分类号： G03F7/004 ,  G03F7/038 ,  G03F7/039 ,  C07C381/12 ,  C07C309/12 ,  C07C309/42 ,  C07D283/00 ,  C07C309/06 ,  C07C309/29 ,  C07C309/19

摘要： An actinic ray-sensitive or radiation-sensitive resin composition including one or more specific compounds selected from the group consisting of a compound represented by General Formula (1), a compound represented by General Formula (2), and a compound represented by General Formula (3), and an acid-decomposable resin.

公开(公告)号：US20160266488A1

公开(公告)日：2016-09-15

申请号：US15158848

申请日：2016-05-19

申请人： FUJIFILM Corporation

发明人： Masafumi KOJIMA ,  Akiyoshi GOTO ,  Akinori SHIBUYA ,  Keita KATO ,  Kei YAMAMOTO

IPC分类号： G03F7/038 ,  G03F7/32 ,  G03F7/20

CPC分类号： G03F7/0397 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/038 ,  G03F7/11 ,  G03F7/20 ,  G03F7/2041 ,  G03F7/325

摘要： An actinic ray-sensitive or radiation-sensitive resin composition contains a resin (P) having a partial structure represented by General Formula (X), and a compound capable of generating an acid upon irradiation with actinic ray or radiation.

摘要翻译： 该活性光敏性或辐射敏感性树脂组合物含有：具有由通式（X）表示的部分结构的树脂（P）; 以及当用活性光或辐射照射时产生酸的化合物。

公开(公告)号：US20210356862A1

公开(公告)日：2021-11-18

申请号：US17307091

申请日：2021-05-04

申请人： FUJIFILM Corporation

发明人： Masafumi KOJIMA ,  Minoru UEMURA ,  Akihiro KANEKO ,  Akiyoshi GOTO ,  Kei YAMAMOTO

IPC分类号： G03F7/004 ,  C07C381/12 ,  C07C309/06 ,  C07C309/12 ,  C07C309/17 ,  C07C311/48 ,  C07D333/46 ,  C07D327/06 ,  C07C25/18

摘要： An actinic ray-sensitive or radiation-sensitive resin composition includes a compound represented by General Formula (I) and an acid-decomposable resin. M1+A−-L-B−M2+  (I)

公开(公告)号：US20170192355A1

公开(公告)日：2017-07-06

申请号：US15467357

申请日：2017-03-23

申请人： FUJIFILM Corporation

发明人： Masafumi KOJIMA ,  Akiyoshi GOTO ,  Akinori SHIBUYA ,  Keita KATO ,  Keiyu OU

IPC分类号： G03F7/038 ,  G03F7/20 ,  G03F7/38 ,  G03F7/004 ,  G03F7/40 ,  H01L21/027 ,  C08F220/18 ,  G03F7/09 ,  G03F7/16 ,  G03F7/32

CPC分类号： G03F7/038 ,  C08F220/18 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/091 ,  G03F7/11 ,  G03F7/16 ,  G03F7/168 ,  G03F7/2041 ,  G03F7/325 ,  G03F7/327 ,  G03F7/38 ,  G03F7/40 ,  H01L21/027

摘要： The present invention has an object to provide a method for forming a negative tone pattern in which shrinkage of a film in post exposure bake is suppressed; a method for manufacturing an electronic device including the pattern forming method; and an active-light-sensitive or radiation-sensitive resin composition. The method for forming a negative tone pattern of the present invention includes: a film formation step of forming an active-light-sensitive or radiation-sensitive resin composition film on a substrate, using a resist composition; an exposing step of irradiating the film with active light or radiation; a heating treatment step of performing a heating treatment on the film irradiated with active light or radiation; and a developing step of developing the heating-treated film using a developer including an organic solvent, in which the resist composition includes a resin A having a repeating unit A with a group represented by a specific formula, a resin B having a repeating unit B with a group represented by a specific formula, and a compound that generates an acid upon irradiation with active light or radiation.

公开(公告)号：US20170168394A1

公开(公告)日：2017-06-15

申请号：US15444471

申请日：2017-02-28

申请人： FUJIFILM Corporation

发明人： Akiyoshi GOTO ,  Masafumi KOJIMA ,  Keita KATO ,  Keiyu OU ,  Michihiro SHIRAKAWA

IPC分类号： G03F7/038 ,  G03F7/16 ,  G03F7/38 ,  C08F220/36 ,  G03F7/40 ,  G03F7/20 ,  C08F220/28 ,  C08F220/18 ,  G03F7/004 ,  G03F7/32

CPC分类号： G03F7/038 ,  C08F220/18 ,  C08F220/24 ,  C08F220/26 ,  C08F220/28 ,  C08F220/36 ,  C08F228/06 ,  C08F230/08 ,  C08F2220/282 ,  C08F2220/283 ,  C08F2220/365 ,  G03F7/004 ,  G03F7/0045 ,  G03F7/0397 ,  G03F7/16 ,  G03F7/168 ,  G03F7/2041 ,  G03F7/32 ,  G03F7/325 ,  G03F7/327 ,  G03F7/38 ,  G03F7/40 ,  H01L21/0274 ,  C08F2220/1858 ,  C08F2220/1866 ,  C08F2220/185 ,  C08F2220/1825 ,  C08F2220/1875 ,  C08F2230/085 ,  C08F220/22

摘要： The present invention has an object to provide an active-light-sensitive or radiation-sensitive resin composition having high DOF and low LWR; a pattern forming method using the composition; and a method for manufacturing an electronic device. The active-light-sensitive or radiation-sensitive resin composition of the present invention includes a resin P and a compound that generates an acid upon irradiation with active light or radiation, in which the resin P has a repeating unit p1 and a repeating unit p2 represented by specific formulae, and the repeating unit p2 does not have a group in which a hydroxy group of a hydroxyadamantyl group is protected with a group that decomposes by the action of an acid to leave.

公开(公告)号：US20170115568A1

公开(公告)日：2017-04-27

申请号：US15399953

申请日：2017-01-06

申请人： FUJIFILM Corporation

发明人： Akiyoshi GOTO ,  Masafumi KOJIMA ,  Michihiro SHIRAKAWA ,  Keita KATO

IPC分类号： G03F7/039 ,  G03F7/16 ,  G03F7/40 ,  G03F7/20 ,  G03F7/38 ,  G03F7/32 ,  G03F7/004 ,  G03F7/09

CPC分类号： G03F7/0397 ,  C08F220/28 ,  G03F7/0045 ,  G03F7/0392 ,  G03F7/091 ,  G03F7/16 ,  G03F7/168 ,  G03F7/2041 ,  G03F7/26 ,  G03F7/325 ,  G03F7/327 ,  G03F7/38 ,  G03F7/40 ,  H01L21/0274

摘要： Provided are an active-light-sensitive or radiation-sensitive resin composition having high depth of focus and excellent resolving power; a pattern forming method using the composition; and a method for manufacturing an electronic device. The composition is an active-light-sensitive or radiation-sensitive resin composition containing a resin (P), in which the resin (P) includes a repeating unit (a) having an acid-decomposable group and a repeating unit (b) having a lactone structure and the like; the repeating unit (a) includes at least a specific repeating unit (a1) represented by General Formula (1); the content of the repeating units (a1) with respect to all the repeating units of the resin (P) is 35% by mole or more; and the resin (P) does not include any of a specific group represented by General Formula (X1), a specific structure represented by General Formula (X2), a hydroxyadamantyl group, and a hydroxyadamantyl group in which a hydroxy group is protected with a group that decomposes by the action of an acid to leave.

公开(公告)号：US20160349613A1

公开(公告)日：2016-12-01

申请号：US15231918

申请日：2016-08-09

申请人： FUJIFILM Corporation

发明人： Akiyoshi GOTO ,  Masafumi KOJIMA ,  Michihiro SHIRAKAWA ,  Keita KATO

IPC分类号： G03F7/038 ,  G03F7/32 ,  G03F7/20

CPC分类号： G03F7/038 ,  C08F220/18 ,  G03F7/004 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/039 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/11 ,  G03F7/2053 ,  G03F7/325

摘要： The actinic ray-sensitive or radiation-sensitive resin composition of the present invention contains a resin (P) including a repeating unit (i) having a group represented by the following General Formula (1), and a compound which generates an acid by irradiation with actinic ray or radiation, represented by a specific formula, a pattern forming method using the composition, a method for manufacturing an electronic device, and an electronic device.

公开(公告)号：US20160048082A1

公开(公告)日：2016-02-18

申请号：US14919329

申请日：2015-10-21

申请人： FUJIFILM Corporation

发明人： Masafumi KOJIMA ,  Akiyoshi GOTO ,  Michihiro SHIRAKAWA ,  Hajime FURUTANI ,  Akinori SHIBUYA

IPC分类号： G03F7/32 ,  G03F7/20

CPC分类号： G03F7/325 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/11 ,  G03F7/20 ,  G03F7/2041 ,  G03F7/2053

摘要： A pattern-forming method includes forming a film on a substrate by using an actinic ray-sensitive or radiation-sensitive resin composition containing at least a resin that exhibits, due to an action of an acid, increase in polarity and decrease in solubility with respect to a developer including an organic solvent, and a compound that generates an acid by being irradiated with actinic rays or radiation; exposing the film; and forming a negative tone pattern by developing the exposed film with a developer including an organic solvent, in which the developer includes at least one compound A selected from the group consisting of an onium salt, a polymer having an onium salt, a nitrogen-containing compound including three or more nitrogen atoms, a basic polymer, and a phosphorus-based compound.

摘要翻译： 图案形成方法包括通过使用至少含有树脂的光化射线敏感性或辐射敏感性树脂组合物在基材上形成膜，所述树脂组合物由于酸的作用而显示极性增加并且溶解度降低 包括有机溶剂的显影剂和通过用光化射线或辐射照射产生酸的化合物; 曝光电影; 以及通过用包括有机溶剂的显影剂显影所述曝光膜形成负色调图案，其中所述显影剂包括至少一种选自以下的化合物A：鎓盐，具有鎓盐的聚合物，含氮的 包括三个或更多个氮原子的化合物，碱性聚合物和磷基化合物。