Invention Application
- Patent Title: ABRASIVE PARTICLES, POLISHING SLURRY AND METHOD OF FABRICATING ABRASIVE PARTICLES
- Patent Title (中): 磨料颗粒,抛光浆料和磨料颗粒的制备方法
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Application No.: US15095008Application Date: 2016-04-08
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Publication No.: US20170002233A1Publication Date: 2017-01-05
- Inventor: Jin Hyung PARK
- Applicant: UBMATERIALS INC.
- Priority: KR10-2015-0093420 20150630
- Main IPC: C09G1/02
- IPC: C09G1/02 ; C09K3/14 ; C01F17/00

Abstract:
The present disclosure relates to abrasive particles, a polishing slurry and a fabricating method of the abrasive particles. The fabricating method of abrasive particles in accordance with an exemplary embodiment of the present disclosure includes preparing a precursor solution in which a first precursor is mixed with a second precursor that is different from the first precursor, preparing a basic solution, mixing the basic solution with the precursor solution and_forming a precipitate, and washing abrasive particles synthesized by precipitation.
Public/Granted literature
- US09790401B2 Abrasive particles, polishing slurry and method of fabricating abrasive particles Public/Granted day:2017-10-17
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