Invention Application
US20170002233A1 ABRASIVE PARTICLES, POLISHING SLURRY AND METHOD OF FABRICATING ABRASIVE PARTICLES 有权
磨料颗粒,抛光浆料和磨料颗粒的制备方法

  • Patent Title: ABRASIVE PARTICLES, POLISHING SLURRY AND METHOD OF FABRICATING ABRASIVE PARTICLES
  • Patent Title (中): 磨料颗粒,抛光浆料和磨料颗粒的制备方法
  • Application No.: US15095008
    Application Date: 2016-04-08
  • Publication No.: US20170002233A1
    Publication Date: 2017-01-05
  • Inventor: Jin Hyung PARK
  • Applicant: UBMATERIALS INC.
  • Priority: KR10-2015-0093420 20150630
  • Main IPC: C09G1/02
  • IPC: C09G1/02 C09K3/14 C01F17/00
ABRASIVE PARTICLES, POLISHING SLURRY AND METHOD OF FABRICATING ABRASIVE PARTICLES
Abstract:
The present disclosure relates to abrasive particles, a polishing slurry and a fabricating method of the abrasive particles. The fabricating method of abrasive particles in accordance with an exemplary embodiment of the present disclosure includes preparing a precursor solution in which a first precursor is mixed with a second precursor that is different from the first precursor, preparing a basic solution, mixing the basic solution with the precursor solution and_forming a precipitate, and washing abrasive particles synthesized by precipitation.
Information query
Patent Agency Ranking
0/0