Invention Application
- Patent Title: THIN FILM DEPOSITING APPARATUS AND THE THIN FILM DEPOSITING METHOD USING THE SAME
- Patent Title (中): 薄膜沉积装置和使用其的薄膜沉积方法
-
Application No.: US15277977Application Date: 2016-09-27
-
Publication No.: US20170016109A1Publication Date: 2017-01-19
- Inventor: Yong-Suk Lee , Myung-Soo Huh , Cheol-Rae Jo , Sang-Hyuk Hong , Jeong-Ho Yi , Suk-Won Jung , Sun-Ho Kim , Mi-Ra An
- Applicant: SAMSUNG DISPLAY CO., LTD.
- Priority: KR10-2011-0144983 20111228
- Main IPC: C23C14/12
- IPC: C23C14/12 ; C23C14/58 ; C23C14/24 ; C23C14/22
Abstract:
A thin film depositing apparatus and a thin film deposition method using the apparatus. The thin film depositing apparatus includes a chamber configured to have a substrate mounted therein, an ejection unit configured to move in the chamber and to eject a deposition vapor to the substrate, and a source supply unit configured to supply a source of the deposition vapor to the ejection unit.
Information query
IPC分类:
