Invention Application
- Patent Title: METHOD OF PRODUCING A SEMICONDUCTOR DEVICE WITH THROUGH-SUBSTRATE VIA COVERED BY A SOLDER BALL
- Patent Title (中): 通过焊球覆盖通过基板制造半导体器件的方法
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Application No.: US15283189Application Date: 2016-09-30
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Publication No.: US20170018518A1Publication Date: 2017-01-19
- Inventor: Cathal CASSIDY , Martin SCHREMS , Franz SCHRANK
- Applicant: ams AG
- Priority: EP11190389.4 20111123
- Main IPC: H01L23/00
- IPC: H01L23/00

Abstract:
A semiconductor substrate is provided with a through-substrate via comprising a metallization and an opening. A solder ball is placed on the opening. A reflow of the solder ball is performed in such a way that the solder ball closes the through-substrate via and leaves a void in the through-substrate via.
Public/Granted literature
- US09773729B2 Method of producing a semiconductor device with through-substrate via covered by a solder ball Public/Granted day:2017-09-26
Information query
IPC分类: