Invention Application
US20170018518A1 METHOD OF PRODUCING A SEMICONDUCTOR DEVICE WITH THROUGH-SUBSTRATE VIA COVERED BY A SOLDER BALL 审中-公开
通过焊球覆盖通过基板制造半导体器件的方法

  • Patent Title: METHOD OF PRODUCING A SEMICONDUCTOR DEVICE WITH THROUGH-SUBSTRATE VIA COVERED BY A SOLDER BALL
  • Patent Title (中): 通过焊球覆盖通过基板制造半导体器件的方法
  • Application No.: US15283189
    Application Date: 2016-09-30
  • Publication No.: US20170018518A1
    Publication Date: 2017-01-19
  • Inventor: Cathal CASSIDYMartin SCHREMSFranz SCHRANK
  • Applicant: ams AG
  • Priority: EP11190389.4 20111123
  • Main IPC: H01L23/00
  • IPC: H01L23/00
METHOD OF PRODUCING A SEMICONDUCTOR DEVICE WITH THROUGH-SUBSTRATE VIA COVERED BY A SOLDER BALL
Abstract:
A semiconductor substrate is provided with a through-substrate via comprising a metallization and an opening. A solder ball is placed on the opening. A reflow of the solder ball is performed in such a way that the solder ball closes the through-substrate via and leaves a void in the through-substrate via.
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