Invention Application
- Patent Title: SEMICONDUCTOR STRUCTURE AND MANUFACTURING METHOD THEREOF
- Patent Title (中): 半导体结构及其制造方法
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Application No.: US14815220Application Date: 2015-07-31
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Publication No.: US20170029268A1Publication Date: 2017-02-02
- Inventor: YI-HSIEN CHANG , CHUN-REN CHENG , WEI-CHENG SHEN , WEN-CHIEN CHEN
- Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.
- Main IPC: B81B3/00
- IPC: B81B3/00 ; B81C1/00

Abstract:
A semiconductor structure includes a first device and a second device. The first device includes a plate including a plurality of apertures; a membrane disposed opposite to the plate and including a plurality of corrugations, and a conductive plug extending through the plate and the membrane. The second device includes a substrate and a bond pad disposed over the substrate, wherein the conductive plug is bonded with the bond pad to integrate the first device with the second device, and the plate includes a semiconductive member and a tensile member, and the semiconductive member is disposed within the tensile member.
Public/Granted literature
- US10737931B2 Semiconductor structure and manufacturing method thereof Public/Granted day:2020-08-11
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