Invention Application
- Patent Title: SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME
- Patent Title (中): 半导体器件及其制造方法
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Application No.: US15292544Application Date: 2016-10-13
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Publication No.: US20170033129A1Publication Date: 2017-02-02
- Inventor: Masahiko HAYAKAWA , Yuta MORIYA , Junya GOTO , Yasuyuki ARAI
- Applicant: Semiconductor Energy Laboratory Co., Ltd.
- Priority: JP2011-017082 20110128
- Main IPC: H01L27/12
- IPC: H01L27/12

Abstract:
The number of photolithography steps used for manufacturing a transistor is reduced to less than the conventional one and a highly reliable semiconductor device is provided. The present invention relates to a semiconductor device including a circuit including a transistor having an oxide semiconductor layer over a first substrate and a second substrate fixed to the first substrate with a sealant. A closed space surrounded by the sealant, the first substrate, and the second substrate is in a reduced pressure state or filled with dry air. The sealant surrounds at least the transistor and has a closed pattern shape. Further, the circuit is a driver circuit including a transistor having an oxide semiconductor layer.
Public/Granted literature
- US10134766B2 Semiconductor device and method for manufacturing the same Public/Granted day:2018-11-20
Information query
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