Invention Application
US20170047219A1 SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, AND COMPUTER-READABLE RECORDING MEDIUM HAVING STORED THEREON SUBSTRATE PROCESSING PROGRAM
审中-公开
基板处理装置，基板处理方法和具有存储的基板处理程序的计算机可读记录介质
- Patent Title: SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, AND COMPUTER-READABLE RECORDING MEDIUM HAVING STORED THEREON SUBSTRATE PROCESSING PROGRAM
- Patent Title (中): 基板处理装置，基板处理方法和具有存储的基板处理程序的计算机可读记录介质
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Application No.: US15307427Application Date: 2015-05-01
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Publication No.: US20170047219A1Publication Date: 2017-02-16
- Inventor: Kazuyoshi Shinohara , Yuki Yoshida
- Applicant: Tokyo Electron Limited
- Priority: JP2014-094640 20140501
- International Application: PCT/JP2015/063091 WO 20150501
- Main IPC: H01L21/02
- IPC: H01L21/02 ; B08B3/08 ; H01L21/67
Abstract:
A substrate processing apparatus includes a substrate rotating unit 11 configured to hold and rotate a substrate 3; a processing liquid supplying unit 13 configured to supply a processing liquid to the substrate; and a replacement liquid supplying unit 14 configured to supply, to the substrate, a replacement liquid with which the processing liquid supplied from the processing liquid supplying unit is replaced. While the replacement liquid supplying unit 14 supplies the replacement liquid to the substrate, the processing liquid supplying unit 13 supplies the processing liquid to a position on the substrate positioned at an outer peripheral side thereof than a supply position of the replacement liquid to form a liquid film of the processing liquid. It is possible to maintain a state in which the entire surface of the substrate is covered with the liquid film without increasing consumption amount of the replacement liquid.
Public/Granted literature
Information query
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