Invention Application
US20170059984A1 PHOTOMASK CLEANING APPARATUS, METHOD OF CLEANING A PHOTOMASK, AND METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE
审中-公开
光电子清洁装置，清洁光电子发射器的方法和制造半导体器件的方法
- Patent Title: PHOTOMASK CLEANING APPARATUS, METHOD OF CLEANING A PHOTOMASK, AND METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE
- Patent Title (中): 光电子清洁装置，清洁光电子发射器的方法和制造半导体器件的方法
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Application No.: US15210872Application Date: 2016-07-14
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Publication No.: US20170059984A1Publication Date: 2017-03-02
- Inventor: Jin-su KIM , Jae-hyuck CHOI , Byung-gook KIM , Soo-wan KOH
- Applicant: Samsung Electronics Co., Ltd.
- Priority: KR10-2015-0121036 20150827
- Main IPC: G03F1/82
- IPC: G03F1/82 ; G03F7/20 ; B08B7/00
Abstract:
Disclosed is a method. The method includes placing a photomask on a receiver of a cleaning apparatus, removing adhesive residue from the photomask by irradiating laser on the adhesive residue, attaching a pellicle to the photomask, and exposing a semiconductor substrate to a light using the photomask, wherein the irradiating laser repeatedly pauses and restarts during the removing of the adhesive residue.
Information query
