公开(公告)号：US20190042102A1

公开(公告)日：2019-02-07

申请号：US16157300

申请日：2018-10-11

Applicant: Samsung Electronics Co., Ltd.

Inventor： Byung-gook KIM ,  Young-bong KIM ,  Seung-hwan HA ,  Sang-hoon YOO

IPC: G06F3/06

CPC classification number: G06F3/0608 ,  G06F3/0613 ,  G06F3/0652 ,  G06F3/0659 ,  G06F3/0679 ,  G06F12/0246

Abstract: Disclosed is a method of operating a memory system which executes a plurality of commands including a write command and a trim command. The memory system includes a memory device, which includes a plurality of blocks. The method further includes performing garbage collection for generating a free block, calculating a workload level in performing the garbage collection, and changing a command schedule based on the workload level.

公开(公告)号：US20180136555A1

公开(公告)日：2018-05-17

申请号：US15865717

申请日：2018-01-09

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Jae-hyuck CHOI ,  Jin-su KIM ,  Kyoung-mi KIM ,  Byung-gook KIM

IPC: G03F1/64

CPC classification number: G03F1/64

Abstract: A pellicle includes a pellicle frame, a pellicle membrane, and an attaching element, a first surface of the attaching element having exposed pores.

公开(公告)号：US20170059984A1

公开(公告)日：2017-03-02

申请号：US15210872

申请日：2016-07-14

Applicant: Samsung Electronics Co., Ltd.

Inventor： Jin-su KIM ,  Jae-hyuck CHOI ,  Byung-gook KIM ,  Soo-wan KOH

IPC: G03F1/82 ,  G03F7/20 ,  B08B7/00

CPC classification number: G03F1/82 ,  B08B7/0042 ,  B08B2220/01

Abstract: Disclosed is a method. The method includes placing a photomask on a receiver of a cleaning apparatus, removing adhesive residue from the photomask by irradiating laser on the adhesive residue, attaching a pellicle to the photomask, and exposing a semiconductor substrate to a light using the photomask, wherein the irradiating laser repeatedly pauses and restarts during the removing of the adhesive residue.

Abstract translation: 公开了一种方法。 该方法包括将光掩模放置在清洁设备的接收器上，通过在粘合剂残留物上照射激光，将防护薄膜组件附着到光掩模上，并使用光掩模将半导体衬底暴露于光来从光掩模去除粘合剂残留物，其中照射 在去除粘合剂残留物时，激光反复停止并重启。