-
1.发明申请PHOTOMASK CLEANING APPARATUS, METHOD OF CLEANING A PHOTOMASK, AND METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE 审中-公开光电子清洁装置，清洁光电子发射器的方法和制造半导体器件的方法公开(公告)号：US20170059984A1
公开(公告)日：2017-03-02
申请号：US15210872
申请日：2016-07-14
Applicant: Samsung Electronics Co., Ltd.
Inventor： Jin-su KIM , Jae-hyuck CHOI , Byung-gook KIM , Soo-wan KOH
CPC classification number: G03F1/82 , B08B7/0042 , B08B2220/01
Abstract: Disclosed is a method. The method includes placing a photomask on a receiver of a cleaning apparatus, removing adhesive residue from the photomask by irradiating laser on the adhesive residue, attaching a pellicle to the photomask, and exposing a semiconductor substrate to a light using the photomask, wherein the irradiating laser repeatedly pauses and restarts during the removing of the adhesive residue.
Abstract translation: 公开了一种方法。 该方法包括将光掩模放置在清洁设备的接收器上，通过在粘合剂残留物上照射激光，将防护薄膜组件附着到光掩模上，并使用光掩模将半导体衬底暴露于光来从光掩模去除粘合剂残留物，其中照射 在去除粘合剂残留物时，激光反复停止并重启。
Search Results
1
records
(took 0.008 seconds)
