Invention Application
US20170068157A1 PELLICLE FOR A REFLECTIVE MASK AND REFLECTIVE MASK ASSEMBLY INCLUDING THE SAME
有权
用于反射掩模和反射掩模组件的装置，包括其中
- Patent Title: PELLICLE FOR A REFLECTIVE MASK AND REFLECTIVE MASK ASSEMBLY INCLUDING THE SAME
- Patent Title (中): 用于反射掩模和反射掩模组件的装置，包括其中
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Application No.: US15183846Application Date: 2016-06-16
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Publication No.: US20170068157A1Publication Date: 2017-03-09
- Inventor: Chang-min PARK , Jin-hong PARK , Myung-soo HWANG
- Applicant: Samsung Electronics Co., Ltd.
- Applicant Address: KR Suwon-si
- Assignee: Samsung Electronics Co. , Ltd.
- Current Assignee: Samsung Electronics Co. , Ltd.
- Current Assignee Address: KR Suwon-si
- Priority: KR10-2015-0125603 20150904
- Main IPC: G03F1/64
- IPC: G03F1/64 ; G03F1/24
Abstract:
A pellicle for a reflective mask including a pellicle body, a light shielding pattern, a grating pattern, and a pellicle frame. The pellicle body includes a central region and a peripheral region, wherein the peripheral region surrounds the central region. The light shielding pattern is formed on the peripheral region of the pellicle body; the grating pattern is formed on the light shielding pattern, and the pellicle frame is located under the peripheral region of the pellicle body, and the pellicle frame is configured to support the pellicle body.
Public/Granted literature
- US09874809B2 Pellicle for a reflective mask and reflective mask assembly including the same Public/Granted day:2018-01-23
Information query
