Invention Application
US20170069463A1 SEASONING PROCESS FOR ESTABLISHING A STABLE PROCESS AND EXTENDING CHAMBER UPTIME FOR SEMICONDUCTOR CHIP PROCESSING
有权
用于建立稳定过程的季节性过程和用于半导体芯片处理的扩展室扩展
- Patent Title: SEASONING PROCESS FOR ESTABLISHING A STABLE PROCESS AND EXTENDING CHAMBER UPTIME FOR SEMICONDUCTOR CHIP PROCESSING
- Patent Title (中): 用于建立稳定过程的季节性过程和用于半导体芯片处理的扩展室扩展
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Application No.: US15259401Application Date: 2016-09-08
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Publication No.: US20170069463A1Publication Date: 2017-03-09
- Inventor: Sang Won KANG , Nicholas CELESTE , Dmitry LUBOMIRSKY , Peter HILLMAN , Douglas Brenton HAYDEN , Dongqing YANG
- Applicant: Applied Materials, Inc.
- Main IPC: H01J37/32
- IPC: H01J37/32 ; H01L21/67
Abstract:
Embodiments of the present disclosure generally provide improved methods for processing substrates with improved process stability, increased mean wafers between clean, and/or improved within wafer uniformity. One embodiment provides a method for seasoning one or more chamber components in a process chamber. The method includes placing a dummy substrate in the process chamber, flowing a processing gas mixture to the process chamber to react with the dummy substrate and generate a byproduct on the dummy substrate, and annealing the dummy substrate to sublimate the byproduct while at least one purge conduit of the process chamber is closed.
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