发明申请
- 专利标题： TIN PULL-BACK AND CLEANING COMPOSITION
- 专利标题（中）： TIN拉回和清洁组合物
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申请号： US15310647申请日： 2015-05-12
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公开(公告)号： US20170076939A1公开(公告)日： 2017-03-16
- 发明人: Jerry Jhih-Jheng KE , Tse Wei YU , Yi-Ping CHENG
- 申请人： BASF SE
- 申请人地址： DE Ludwigshafen
- 专利权人： BASF SE
- 当前专利权人： BASF SE
- 当前专利权人地址： DE Ludwigshafen
- 优先权： EP14168103.1 20140513
- 国际申请： PCT/IB2015/053483 WO 20150512
- 主分类号： H01L21/02
- IPC分类号： H01L21/02 ; C11D3/37 ; C11D3/39 ; H01L21/311 ; C11D7/32 ; C11D7/34 ; C11D7/50 ; C09K13/00 ; C11D11/00 ; C11D7/26
摘要：
The present invention relates to a novel composition that may be used to control the etching rate of TIN with respect to W, and remove any residues from the surface, e.g. organic or inorganic residues that could contain fluorine (F), which composition comprises a) an aliphatic or aromatic sulfonic acid; b) one or more inhibitor(s); c) an aprotic solvent; d) a glycol ether; and e) water. The present invention also relates to a kit comprising said composition in combination with an oxidant and optionally a stabilizer of the oxidant, and the use thereof.
公开/授权文献
- US10170296B2 TiN pull-back and cleaning composition 公开/授权日：2019-01-01
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