Invention Application
- Patent Title: X-RAY LASER MICROSCOPY SAMPLE ANALYSIS SYSTEM AND METHOD
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Application No.: US15442670Application Date: 2017-02-26
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Publication No.: US20170169910A1Publication Date: 2017-06-15
- Inventor: Allison Sihan Jia , Muzhi Liu , Yuhao Wang , Kevin Shaokang You , Jingyi Zhang , Zhuotong Xian
- Applicant: Rising Star Pathway, a California Corporation
- Main IPC: G21K7/00
- IPC: G21K7/00 ; G01N23/00

Abstract:
Improved system and method of X-ray laser microscopy that combines information obtained from both X-ray diffraction and X-ray imaging methods. At least one sample is placed in an ultra-cold, ultra-low pressure vacuum chamber, often using a sample administration device configured to present a plurality of samples. The sample is exposed to brief bursts of coherent X-ray illumination, often further concentrated using X-ray mirrors and pinhole collimation methods. Higher resolution data from the samples is obtained using hard X-ray lasers, such as free electron X-ray lasers, and X-ray diffraction methods. Lower resolution data from the same samples can be obtained using any of hard or soft X-ray laser sources, and X-ray imaging methods employing nanoscale etched zone plate technology. In some embodiments both diffraction and imaging data can be obtained simultaneously. Data from both sources are combined to create a more complete representation of the samples.
Public/Granted literature
- US09859029B2 X-ray laser microscopy sample analysis system and method Public/Granted day:2018-01-02
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