- 专利标题: ION SOURCE, QUADRUPOLE MASS SPECTROMETER AND RESIDUAL GAS ANALYZING METHOD
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申请号: US15370365申请日: 2016-12-06
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公开(公告)号: US20170170000A1公开(公告)日: 2017-06-15
- 发明人: Masanobu NAKAZONO , Hirotaka YABUSHITA , Junya NAKAI , Tomoko KATSUDA
- 申请人: HORIBA STEC, CO., LTD.
- 申请人地址: JP Kyoto
- 专利权人: HORIBA STEC, CO., LTD.
- 当前专利权人: HORIBA STEC, CO., LTD.
- 当前专利权人地址: JP Kyoto
- 优先权: JP2015-242481 20151211
- 主分类号: H01J49/16
- IPC分类号: H01J49/16 ; H01J49/42 ; H01J49/00
摘要:
In order to attain a main objective of the present invention to provide an ion source capable of efficiently extracting ions, the ion source is configured to include: a conductive tubular body having an ion emitting aperture in a tip surface thereof and a penetration portion in a side wall thereof allowing thermo-electrons to pass through from an outside toward an inside; a mesh surrounding an outer periphery of the penetration portion; and a thermionic emission filament surrounding an outer periphery of the mesh, such that the thermo-electrons emitted from the thermionic emission filament pass through the mesh and reach the inside of the conductive tubular body through the penetration portion.
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