Invention Application
- Patent Title: METHOD OF MANUFACTURING THIN FILM TRANSISTOR, THIN FILM TRANSISTOR MANUFACTURED BY THE METHOD, AND ELECTRONIC DEVICE COMPRISING THE THIN FILM TRANSISTOR
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Application No.: US15168342Application Date: 2016-05-31
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Publication No.: US20170194583A1Publication Date: 2017-07-06
- Inventor: Youngjun Yun , Joo Young KIM , Byong Gwon SONG , Jaewon JANG , Jiyoung JUNG , Ajeong CHOI
- Applicant: Samsung Electronics Co., Ltd.
- Applicant Address: KR Suwon-si,
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Suwon-si,
- Priority: KR10-2015-0191451 20151231
- Main IPC: H01L51/05
- IPC: H01L51/05 ; H01L27/28 ; H01L51/00

Abstract:
A method of manufacturing a thin film transistor includes forming a gate electrode, forming a gate insulating layer on the gate electrode, forming an organic semiconductor layer on the gate insulating layer, forming a solvent selective photosensitive layer on the organic semiconductor layer, forming an organic semiconductor pattern and a solvent selective photosensitive pattern by simultaneously patterning the organic semiconductor layer and the solvent selective photosensitive layer, respectively, and forming a source electrode and a drain electrode on the organic semiconductor pattern and the solvent selective photosensitive pattern, the source electrode and the drain electrode being electrically connected to the organic semiconductor pattern.
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Information query
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