- 专利标题: PELLICLE AND METHOD FOR MANUFACTURING THE SAME
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申请号: US14996966申请日: 2016-01-15
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公开(公告)号: US20170205705A1公开(公告)日: 2017-07-20
- 发明人: Jeng-Shin Ma , Tsiao-Chen Wu , Chi-Ming Yang , Chyi Shyuan Chern , Chih-Cheng Lin , Yun-Yue Lin
- 申请人: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.
- 主分类号: G03F1/64
- IPC分类号: G03F1/64
摘要:
A method for manufacturing a pellicle includes: providing a supporting substrate; forming an oxide layer over the supporting substrate; forming a metal layer over the oxide layer; forming a graphene layer over the metal layer; and removing at least a portion of the supporting substrate and the oxide layer. An associated method includes: providing a supporting substrate; forming a first silicon carbide (SiC) layer or a diamond layer over the supporting substrate; forming a graphene layer over the SiC layer or the diamond layer; and removing at least a portion of the supporting substrate and the first silicon carbide (SiC) layer or the diamond layer; wherein the pellicle is at least partially transparent to extreme ultraviolet (EUV) radiation. An associated pellicle is also disclosed.
公开/授权文献
- US09864270B2 Pellicle and method for manufacturing the same 公开/授权日:2018-01-09