Invention Application
- Patent Title: R-T-B BASED PERMANENT MAGNET
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Application No.: US15440667Application Date: 2017-02-23
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Publication No.: US20170278602A1Publication Date: 2017-09-28
- Inventor: Takurou IWASA , Masashi MIWA
- Applicant: TDK CORPORATION
- Applicant Address: JP Tokyo
- Assignee: TDK CORPORATION
- Current Assignee: TDK CORPORATION
- Current Assignee Address: JP Tokyo
- Priority: JP2016-063479 20160328
- Main IPC: H01F1/053
- IPC: H01F1/053 ; C22C38/16 ; C22C38/14 ; C22C38/10 ; C21D3/06 ; C22C38/00 ; B22F9/04 ; B22F3/12 ; B22F5/00 ; H01F1/06 ; C22C38/06

Abstract:
An R-T-B based permanent magnet includes R-T-B based compounds as main-phase crystal grains. R is a rare earth element. T is iron group element(s) essentially including Fe or Fe and Co. B is boron. A two-grain boundary is contained between the two adjacent main-phase crystal grains. An average grain size of the main-phase crystal grains is 0.9 μm or more and 2.8 μm or less. A thickness of the two-grain boundary is 5 nm or more and 200 nm or less.
Public/Granted literature
- US10529473B2 R-T-B based permanent magnet Public/Granted day:2020-01-07
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