Invention Application
- Patent Title: PLASMA PROCESSING METHOD
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Application No.: US15464503Application Date: 2017-03-21
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Publication No.: US20170278675A1Publication Date: 2017-09-28
- Inventor: Kumiko Ono , Hiroshi Tsujimoto , Koichi Nagami
- Applicant: Tokyo Electron Limited
- Priority: JP2016-057010 20160322
- Main IPC: H01J37/32
- IPC: H01J37/32

Abstract:
In a plasma processing method in which multiple cycles, each of which includes a first stage of generating plasma of a first processing gas containing a first gas and a second stage of generating plasma of a second processing gas containing the first gas and a second gas, are performed, a time difference between a start time point of a time period during which the second stage is performed and a start time point of an output of the second gas from a gas supply system is decided automatically according to a recipe. A delay time corresponding to flow rates of the first gas and the second gas in the second stage is specified from a function or a table. The output of the second gas is begun prior to the start time point of the second stage by a time difference set based on the delay time.
Public/Granted literature
- US09960016B2 Plasma processing method Public/Granted day:2018-05-01
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