Invention Application
- Patent Title: ADHESIVE COMPOSITION, ADHESIVE SHEET, AND BACK GRINDING METHOD FOR SEMICONDUCTOR WAFER
-
Application No.: US15622988Application Date: 2017-06-14
-
Publication No.: US20170290217A1Publication Date: 2017-10-05
- Inventor: Se Ra KIM , Yoon Jeong BAEK , Jang Soon KIM , Jae Kwan LEE , Hyun Woo PARK
- Applicant: LG CHEM, LTD.
- Applicant Address: KR SEOUL
- Assignee: LG CHEM, LTD.
- Current Assignee: LG CHEM, LTD.
- Current Assignee Address: KR SEOUL
- Priority: KR10-2008-0044494 20080514
- Main IPC: C09J133/04
- IPC: C09J133/04

Abstract:
The present invention relates to a pressure-sensitive adhesive composition including a polymer of a monomer mixture containing isobornyl (meth)acrylate, a pressure-sensitive adhesive sheet, and a semiconductor wafer backgrinding method. In the present invention, by using isobornyl (meth)acrylate which is a hard-type monomer and has a low hydrophilic property, a pressure-sensitive adhesive composition having superior releasing and re-releasing properties and wettability with respect to the wafer, and having an excellent wafer-proofing property; a pressure-sensitive adhesive sheet prepared by using the pressure-sensitive adhesive composition; and a backgrinding method using the pressure-sensitive adhesive sheet can be provided.
Information query
IPC分类: