Invention Application
- Patent Title: THIN REFERENCE LAYER FOR STT MRAM
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Application No.: US15094064Application Date: 2016-04-08
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Publication No.: US20170294573A1Publication Date: 2017-10-12
- Inventor: Guohan Hu , Younghyun Kim , Daniel C. Worledge
- Applicant: International Business Machines Corporation , Samsung Electronics Co., Ltd.
- Main IPC: H01L43/08
- IPC: H01L43/08 ; H01L27/24 ; H01L43/02 ; H01L43/12 ; H01L43/10

Abstract:
Techniques relate to forming a magnetic tunnel junction (MTJ). A synthetic antiferromagnetic reference layer is adjacent to a tunnel barrier layer. The synthetic antiferromagnetic reference layer includes a first magnetic layer, a second magnetic layer, and a reference spacer layer sandwiched between the first magnetic layer and the second magnetic layer. A magnetic free layer is adjacent to the tunnel barrier layer so as to be opposite the synthetic antiferromagnetic reference layer. The synthetic antiferromagnetic reference layer has a thickness of at least one of 3 nanometers (nm), 4 nm, and 3-4 nm.
Public/Granted literature
- US10361361B2 Thin reference layer for STT MRAM Public/Granted day:2019-07-23
Information query
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