Invention Application
- Patent Title: Computer Assisted Weak Pattern Detection and Quantification System
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Application No.: US15275726Application Date: 2016-09-26
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Publication No.: US20170309009A1Publication Date: 2017-10-26
- Inventor: Naoshin Haque , Allen Park , Ajay Gupta
- Applicant: KLA-Tencor Corporation
- Main IPC: G06T7/00
- IPC: G06T7/00

Abstract:
Methods and systems for providing weak pattern (or hotspot) detection and quantification are disclosed. A weak pattern detection and quantification system may include a wafer inspection tool configured to inspect a wafer and detect defects present on the wafer. The system may also include at least one processor in communication with the wafer inspection tool. The at least one processor may be configured to: perform pattern grouping on the detected defects based on design of the wafer; identify regions of interest based on the pattern grouping; identify weak patterns contained in the regions of interest identified, the weak patterns being patterns deviating from the design by an amount greater than a threshold; validate the weak patterns identified; and report the validated weak patterns or facilitate revision of the design of the wafer based on the validated weak patterns.
Public/Granted literature
- US10740888B2 Computer assisted weak pattern detection and quantification system Public/Granted day:2020-08-11
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