- 专利标题: 183NM Laser And Inspection System
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申请号: US15659981申请日: 2017-07-26
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公开(公告)号: US20170323716A1公开(公告)日: 2017-11-09
- 发明人: Yung-Ho Alex Chuang , J. Joseph Armstrong , Yujun Deng , Vladimir Dribinski , John Fielden , Jidong Zhang
- 申请人: KLA-Tencor Corporation
- 主分类号: H01F17/00
- IPC分类号: H01F17/00 ; H01F27/29 ; H01F17/04
摘要:
A laser assembly for generating laser output light at an output wavelength of approximately 183 nm includes a fundamental laser, an optical parametric system (OPS), a fifth harmonic generator, and a frequency mixing module. The fundamental laser generates fundamental light at a fundamental frequency. The OPS generates a down-converted signal at a down-converted frequency. The fifth harmonic generator generates a fifth harmonic of the fundamental light. The frequency mixing module mixes the down-converted signal and the fifth harmonic to produce the laser output light at a frequency equal to a sum of the fifth harmonic frequency and the down-converted frequency. The OPS generates the down-converted signal by generating a down-converted seed signal at the down-converted frequency, and then mixing the down-converted seed signal with a portion of the fundamental light. At least one of the frequency mixing, frequency conversion or harmonic generation utilizes an annealed, deuterium-treated or hydrogen-treated CLBO crystal.
公开/授权文献
- US10199149B2 183NM laser and inspection system 公开/授权日:2019-02-05
信息查询
IPC分类:
H | 电学 |
H01 | 基本电气元件 |
H01F | 磁体;电感;变压器;磁性材料的选择 |
H01F17/00 | 信号类型的固定电感器 |