Invention Application
- Patent Title: SURFACE MODIFYING MATERIAL FOR SEMICONDUCTOR DEVICE FABRICATION
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Application No.: US15169162Application Date: 2016-05-31
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Publication No.: US20170345648A1Publication Date: 2017-11-30
- Inventor: Chen-Yu LIU , Ching-Yu CHANG
- Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
- Main IPC: H01L21/02
- IPC: H01L21/02 ; H01L21/033 ; H01L21/306
Abstract:
Methods and materials for making a semiconductor device are described. The method includes forming a surface preparation layer over the semiconductor substrate. The surface preparation material layer includes an aziridine structure. A coating layer may then be deposited on the surface preparation material layer.
Public/Granted literature
- US10177001B2 Surface modifying material for semiconductor device fabrication Public/Granted day:2019-01-08
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