Invention Application
- Patent Title: Charged Particle Beam System and Method of Aberration Correction
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Application No.: US15617186Application Date: 2017-06-08
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Publication No.: US20170365442A1Publication Date: 2017-12-21
- Inventor: Shigeyuki Morishita
- Applicant: JEOL Ltd.
- Priority: JP2016-115978 20160610
- Main IPC: H01J37/153
- IPC: H01J37/153 ; H01J37/28

Abstract:
There is provided a charged particle beam system for reducing phase variations in a charged particle beam due to sixth order three-lobe aberration. The charged particle beam system (100) is equipped with an aberration corrector (30) for correcting aberrations in the optical system, and includes: an aberration measuring section (44) for measuring sixth order three-lobe aberration of sixth order geometric aberration, a computing section (46) for computing the magnitude of at least one of fourth order three-lobe aberration of fourth order geometric aberration and three-fold astigmatism of second order geometric aberration for reducing phase variations in the charged particle beam due to the sixth order three-lobe aberration on the basis of the measured sixth order three-lobe aberration, and a controller (48) for controlling the aberration corrector (30) to produce at least one of the fourth order three-lobe aberration and the three-fold astigmatism on the basis of the computed magnitude.
Public/Granted literature
- US09892886B2 Charged particle beam system and method of aberration correction Public/Granted day:2018-02-13
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