- 专利标题： Process for Reducing the Defects in an Ordered Film of Block Copolymer
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申请号： US15545113申请日： 2016-01-21
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公开(公告)号： US20180011399A1公开(公告)日： 2018-01-11
- 发明人: Xavier Chevalier , Raber Inoubli , Christophe Navarro , Celia Nicolet
- 申请人： Arkema France
- 申请人地址： FR Colombes
- 专利权人： Arkema France
- 当前专利权人： Arkema France
- 当前专利权人地址： FR Colombes
- 优先权： FR1550470 20150121
- 国际申请： PCT/FR2016/050115 WO 20160121
- 主分类号： G03F1/72
- IPC分类号： G03F1/72 ; C08G81/02
摘要：
The present invention relates to a process for reducing the number of defects in an ordered film comprising a block copolymer (BCP). The invention also relates to the compositions used to obtain these ordered films and to the resulting ordered films that can be used in particular as masks in the lithography field.
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