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公开(公告)号：US20240103361A1
公开(公告)日：2024-03-28
申请号：US18389360
申请日：2023-11-14
Applicant: Arkema France
Inventor： Christophe Navarro , Celia Nicolet , Xavier Chevalier , Florian Delachat , Hubert Teyssedre
IPC: G03F7/00 , B29C33/42 , B29C33/62 , C08F112/08 , C08F120/26 , C08F130/02 , C08F212/08 , C08F220/28 , C08F230/02
CPC classification number: G03F7/0002 , B29C33/424 , B29C33/62 , C08F112/08 , C08F120/26 , C08F130/02 , C08F212/08 , C08F220/281 , C08F230/02 , C08F2438/02
Abstract: A process for transfer imprinting using a novel family of anti-sticking layers, such as for nanoimprint lithography processes, is described.
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公开(公告)号：US20210072639A1
公开(公告)日：2021-03-11
申请号：US16955402
申请日：2018-12-19
Applicant: Arkema France
Inventor： Christophe Navarro , Celia Nicolet , Xavier Chevalier , Florian Delachat , Hubert Teyssedre
IPC: G03F7/00 , B29C33/62 , B29C33/42 , C08F112/08 , C08F212/08 , C08F120/26 , C08F220/28 , C08F230/02 , C08F130/02
Abstract: A process for transfer imprinting using a novel family of anti-sticking layers, such as for nanoimprint lithography processes, is described.
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3.发明申请PROCESS FOR PRODUCING THICK NANOSTRUCTURED FILMS OBTAINED FROM A BLOCK COPOLYMER COMPOSITION 审中-公开用于制备从嵌段共聚物组合物获得的厚度非常小的纳米结构膜的方法公开(公告)号：US20150073094A1
公开(公告)日：2015-03-12
申请号：US14481421
申请日：2014-09-09
Applicant: ARKEMA FRANCE , CNRS , UNIVERSITÉ DE BORDEAUX , INSTITUT POLYTECHNIQUE DE BORDEAUX
Inventor： Christophe Navarro , Xavier Chevalier , Celia Nicolet , Ilias Iliopoulos , Raluca Tiron , Guillaume Fleury , Georges Hadziioannou
CPC classification number: B05D3/046 , B05D1/005 , B05D3/0254 , C08F293/005 , C08F2438/02 , C08J5/18 , C08J2353/00 , C08L53/00 , C08L2205/025 , C08L2205/03 , C09D153/00 , G03F1/50 , G03F1/68 , G03F7/0002
Abstract: The present invention relates to a process for producing nanostructured films obtained from block copolymers exhibiting a dispersity index of between 1.1 and 2, limits included, without nanostructuring defects, on a surface, in order for this treated surface to be able to be used as masks for applications in microelectronics.
Abstract translation: 本发明涉及从表面分散指数介于1.1和2之间的嵌段共聚物制备纳米结构膜的方法，所述分散指数在表面上包括没有纳米结构缺陷的限制，以使该处理过的表面能够用作掩模 适用于微电子学。
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公开(公告)号：US20150060737A1
公开(公告)日：2015-03-05
申请号：US14390696
申请日：2013-04-03
Applicant: Arkema France , Centre National De La Recherche Scientifique , Universite De Bordeaux 1 , Institut Polytechnique De Bordeaux
Inventor： Christophe Navarro , Katerina Bethani , Cyril Brochon , Henri Cramail , Guillaume Fleury , Georges Hadziioannou , Eric Cloutet
CPC classification number: H01B1/124 , C08G61/126 , C08G2261/126 , C08G2261/18 , C08G2261/3223 , C08G2261/91 , C08K3/041 , C08K3/042 , C08K3/045 , C08K7/06 , C08L25/18 , C08L65/00 , H01B1/127 , H01B1/14 , H01L51/0036 , H01L51/0043 , H01L51/444 , C08K3/04 , C08K7/24
Abstract: The invention relates to novel block copolymers that enable a good dispersion of nanofillers in water and also to a dispersion of nanofillers obtained owing to these block copolymers. This dispersion may be used as a transparent electrode in organic solar cells or other photoemitter or photoreceptor devices.
Abstract translation: 本发明涉及使纳米填料在水中分散良好的新型嵌段共聚物，以及由于这些嵌段共聚物而获得的纳米填料的分散体。 该分散体可以用作有机太阳能电池或其他光电发射器或感光器件中的透明电极。
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公开(公告)号：US11880131B2
公开(公告)日：2024-01-23
申请号：US16955402
申请日：2018-12-19
Applicant: Arkema France
Inventor： Christophe Navarro , Celia Nicolet , Xavier Chevalier , Florian Delachat , Hubert Teyssedre
IPC: G03F7/00 , B29C33/62 , B29C33/42 , C08F112/08 , C08F212/08 , C08F120/26 , C08F220/28 , C08F230/02 , C08F130/02
CPC classification number: G03F7/0002 , B29C33/424 , B29C33/62 , C08F112/08 , C08F120/26 , C08F130/02 , C08F212/08 , C08F220/281 , C08F230/02 , C08F2438/02
Abstract: A process for transfer imprinting using a novel family of anti-sticking layers, such as for nanoimprint lithography processes, is described.
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Patent Agency Ranking
公开(公告)号：US20230012890A1
公开(公告)日：2023-01-19
申请号：US17787406
申请日：2020-12-29
Inventor： Xavier Chevalier , Marc Zelsmann , Christophe Navarro , Gwenaëlle Pound-Lana
Abstract: The invention relates to a method for nanostructuring a substrate (10) for the preparation of a nanostructured substrate having nanostructures of different dimensions, the method including removing the crosslinked polymer layer (TC) and one of the blocks of the nanostructured block copolymer so as to form patterns of a nanolithography mask; said method being characterized in that the removal of one of the blocks is a removal of only a portion of the nanodomains (21, 22) of one of the blocks of the nanostructured block copolymer, in particular of only the perpendicular nanodomains (Z1) of said block, such that the parallel nanodomains (21, 22) of at least two blocks of the nanostructured block copolymer form patterns of the nanolithography mask; and so as to generate in the nanolithography mask patterns (M1, M2, M3) of different dimensions and nanostructures in the nanostructured substrate of different dimensions after etching.
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7.发明申请公开(公告)号：US20190187559A1
公开(公告)日：2019-06-20
申请号：US16311465
申请日：2017-06-22
Applicant: Arkema France , Centre National De La Recherche Scientifique - CNR , Universite Toulouse III - Paul Sabatier
Inventor： Christophe Navarro , Didier Bourissou , Blanca Martin-Vaca , Aline Couffin , Franck Kayser
IPC: G03F7/039 , C08G64/18 , C08G77/445 , G03F7/038 , G03F7/075
CPC classification number: G03F7/039 , C08G63/08 , C08G64/183 , C08G77/445 , G03F7/0002 , G03F7/038 , G03F7/0757
Abstract: Provided is a block copolymer film nanostructured in nanodomains, where the copolymer includes at least one first biodegradable block of polyester type and a second block of a different chemical nature than the first block. The first block of polyester type is polybutyrolactone (PBL) and the second block is derived from an oligomer or from a polymer bearing a hydroxyl function on at least one end and acting as macro-initiator of the polymerization of β-butyrolactone (β-BL) to give polybutyrolactone (PBL).
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公开(公告)号：US10199135B2
公开(公告)日：2019-02-05
申请号：US15033455
申请日：2014-10-29
Applicant: Arkema France , Centre National De La Recherche Scientifique (CNRS) , Universite De Bordeaux , Institut Polytechnique De Bordeaux
Inventor： Christophe Navarro , Wiljan Smaal , Muhammad Mumtaz , Eric Cloutet , Cyril Brochon , Georges Hadziioannou
Abstract: The invention relates to stable compositions of carbon nanotubes and of electrolytic polymers, these electrolytic polymers being characterized by the presence of phosphonyl imide or sulfonyl imide functions or alternatively phosphoric acid functions. The invention also relates to the manufacture of transparent electrodes comprising these compositions of carbon nanotubes and of electrolytic polymers.
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公开(公告)号：US20140370198A1
公开(公告)日：2014-12-18
申请号：US14363868
申请日：2012-12-05
Inventor： Christophe Navarro , Stéphanie Magnet , Xavier Chevalier , Raluca Tiron , Christophe Couderc
IPC: B05D3/10 , C09D153/00 , B05D5/00 , B05D3/02 , B05D3/06
CPC classification number: B05D3/108 , B05D3/0254 , B05D3/06 , B05D5/00 , B05D7/52 , B05D7/56 , C08F293/005 , C08F2438/02 , C09D125/08 , C09D125/14 , C09D133/04 , C09D133/10 , C09D153/00 , G03F7/0002 , G03F7/16 , C08F212/08 , C08F220/14
Abstract: The invention relates to a surface preparation method using a combination of at least two polymers, which are the same or different, which are grafted hierarchically or multiply on a surface, and also to the use of this preparation method, more particularly in applications for controlling the surface energy of a substrate. The invention may allow a block polymer to be structured with a minimum of defects.
Abstract translation: 本发明涉及使用至少两种相同或不同的聚合物的组合的表面制备方法，所述聚合物在表面上分层或多次接枝，也涉及使用该制备方法，更具体地说，涉及用于控制 衬底的表面能。 本发明可以允许嵌段聚合物以最小的缺陷构造。
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10.发明申请公开(公告)号：US20200057368A1
公开(公告)日：2020-02-20
申请号：US16656103
申请日：2019-10-17
Applicant: Arkema France
Inventor： Xavier Chevalier , Raber Inoubli , Christophe Navarro , Celia Nicolet
Abstract: Provided is a process for controlling the critical dimension uniformity of ordered films of block copolymers on a nanometric scale. The invention also relates to the compositions used for controlling the critical dimension uniformity of ordered films of block copolymers and to the resulting ordered films that can be used in particular as masks in the lithography field.
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