公开(公告)号：US11880131B2

公开(公告)日：2024-01-23

申请号：US16955402

申请日：2018-12-19

Applicant: Arkema France

Inventor： Christophe Navarro ,  Celia Nicolet ,  Xavier Chevalier ,  Florian Delachat ,  Hubert Teyssedre

IPC: G03F7/00 ,  B29C33/62 ,  B29C33/42 ,  C08F112/08 ,  C08F212/08 ,  C08F120/26 ,  C08F220/28 ,  C08F230/02 ,  C08F130/02

CPC classification number: G03F7/0002 ,  B29C33/424 ,  B29C33/62 ,  C08F112/08 ,  C08F120/26 ,  C08F130/02 ,  C08F212/08 ,  C08F220/281 ,  C08F230/02 ,  C08F2438/02

Abstract: A process for transfer imprinting using a novel family of anti-sticking layers, such as for nanoimprint lithography processes, is described.

公开(公告)号：US20230063847A1

公开(公告)日：2023-03-02

申请号：US17785324

申请日：2020-12-29

Applicant: ARKEMA FRANCE

Inventor： Xavier Chevalier

IPC: G03F7/00 ,  G03F7/038 ,  G03F7/095 ,  G03F7/09 ,  C08J3/24

Abstract: The invention relates to a crosslinkable prepolymer composition for use as a contrast layer. It also relates to a method for structuring an interface material. This method is characterized in particular by the following steps:
depositing, on a block copolymer film, a prepolymer composition layer comprising a plurality of functional monomers and at least one crosslinkable functional group within its polymer chain and, on the other hand, two chemically different crosslinking agents, each agent being capable of initiating the crosslinking of said prepolymer in response to a stimulation specific thereto,
subjecting the stack to a first stimulation localized on first areas, so as to cause a crosslinking reaction of the molecular chains of said prepolymer, and subjecting the stack to a second stimulation, so as to cause crosslinking of the molecular chains of said prepolymer by the action of said second crosslinking agent in secondary areas.

公开(公告)号：US20230012890A1

公开(公告)日：2023-01-19

申请号：US17787406

申请日：2020-12-29

Applicant: ARKEMA FRANCE ,  CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE ,  UNIVERSITE GRENOBLE ALPES

Inventor： Xavier Chevalier ,  Marc Zelsmann ,  Christophe Navarro ,  Gwenaëlle Pound-Lana

IPC: G03F7/00 ,  B82Y40/00

Abstract: The invention relates to a method for nanostructuring a substrate (10) for the preparation of a nanostructured substrate having nanostructures of different dimensions, the method including removing the crosslinked polymer layer (TC) and one of the blocks of the nanostructured block copolymer so as to form patterns of a nanolithography mask; said method being characterized in that the removal of one of the blocks is a removal of only a portion of the nanodomains (21, 22) of one of the blocks of the nanostructured block copolymer, in particular of only the perpendicular nanodomains (Z1) of said block, such that the parallel nanodomains (21, 22) of at least two blocks of the nanostructured block copolymer form patterns of the nanolithography mask; and so as to generate in the nanolithography mask patterns (M1, M2, M3) of different dimensions and nanostructures in the nanostructured substrate of different dimensions after etching.

公开(公告)号：US20140370198A1

公开(公告)日：2014-12-18

申请号：US14363868

申请日：2012-12-05

Applicant: ARKEMA FRANCE ,  COMMISSARIAT A L'ENERGIE ATOMIQUE ET AUX ENERGIES ALTERNATIVES

Inventor： Christophe Navarro ,  Stéphanie Magnet ,  Xavier Chevalier ,  Raluca Tiron ,  Christophe Couderc

IPC: B05D3/10 ,  C09D153/00 ,  B05D5/00 ,  B05D3/02 ,  B05D3/06

CPC classification number: B05D3/108 ,  B05D3/0254 ,  B05D3/06 ,  B05D5/00 ,  B05D7/52 ,  B05D7/56 ,  C08F293/005 ,  C08F2438/02 ,  C09D125/08 ,  C09D125/14 ,  C09D133/04 ,  C09D133/10 ,  C09D153/00 ,  G03F7/0002 ,  G03F7/16 ,  C08F212/08 ,  C08F220/14

Abstract: The invention relates to a surface preparation method using a combination of at least two polymers, which are the same or different, which are grafted hierarchically or multiply on a surface, and also to the use of this preparation method, more particularly in applications for controlling the surface energy of a substrate. The invention may allow a block polymer to be structured with a minimum of defects.

Abstract translation: 本发明涉及使用至少两种相同或不同的聚合物的组合的表面制备方法，所述聚合物在表面上分层或多次接枝，也涉及使用该制备方法，更具体地说，涉及用于控制 衬底的表面能。 本发明可以允许嵌段聚合物以最小的缺陷构造。

公开(公告)号：US10011675B2

公开(公告)日：2018-07-03

申请号：US15105245

申请日：2014-12-15

Applicant: Arkema France

Inventor： Christophe Navarro ,  Celia Nicolet ,  Xavier Chevalier

IPC: C08F297/02 ,  B82Y30/00 ,  C09D153/00 ,  G03F7/00 ,  B82Y40/00 ,  C08J5/18

CPC classification number: C08F297/026 ,  B82Y30/00 ,  B82Y40/00 ,  C08J5/18 ,  C08J2353/00 ,  C09D153/00 ,  G03F7/0002 ,  Y10S438/945 ,  Y10S524/905 ,  Y10S525/915

Abstract: The invention relates to a block copolymer film nanostructured in nanodomains at a predetermined temperature, obtained from a basic block copolymer which is nonstructured at said predetermined temperature, and at least one block of which comprises styrene and at least another block of which comprises methyl methacrylate. The block copolymer film is useful for forming nano-lithography masks.

公开(公告)号：US20180011399A1

公开(公告)日：2018-01-11

申请号：US15545113

申请日：2016-01-21

Applicant: Arkema France

Inventor： Xavier Chevalier ,  Raber Inoubli ,  Christophe Navarro ,  Celia Nicolet

IPC: G03F1/72 ,  C08G81/02

CPC classification number: G03F1/72 ,  C08G81/021 ,  G03F7/0002

Abstract: The present invention relates to a process for reducing the number of defects in an ordered film comprising a block copolymer (BCP). The invention also relates to the compositions used to obtain these ordered films and to the resulting ordered films that can be used in particular as masks in the lithography field.

公开(公告)号：US09599890B2

公开(公告)日：2017-03-21

申请号：US14654277

申请日：2013-12-16

Applicant: ARKEMA FRANCE ,  COMMISSARIAT A L'ENERGIE ATOMIQUE ET AUX ENERGIES ALTERNATIVES

Inventor： Christophe Navarro ,  Maxime Argoud ,  Xavier Chevalier ,  Raluca Tiron ,  Ahmed Gharbi

IPC: G03F7/004 ,  G03F1/76 ,  G03F1/00 ,  B82Y30/00 ,  H01L21/027 ,  C08L53/00 ,  G03F7/00 ,  G03F7/32

CPC classification number: G03F1/76 ,  B82Y30/00 ,  C08L53/00 ,  G03F1/00 ,  G03F7/0002 ,  G03F7/325 ,  H01L21/0274

Abstract: The invention concerns a manufacturing method for nanolithography masks from a PS-b-PMMA block copolymer film deposited on a surface to be etched, said copolymer film comprising PMMA nanodomains orientated perpendicularly to the surface to be etched, said method being characterized in that it comprises the following steps: partially irradiating said copolymer film to form a first irradiated area and a second non-irradiated area in said copolymer film, then treating said copolymer film in a developer solvent to selectively remove at least said PMMA nanodomains of said first irradiated area of said copolymer film.

公开(公告)号：US09296014B2

公开(公告)日：2016-03-29

申请号：US14340075

申请日：2014-07-24

Applicant: Arkema France

Inventor： Christophe Navarro ,  Xavier Chevalier ,  Celia Nicolet

IPC: G03F7/00 ,  B05D3/04 ,  G03F1/68 ,  B05D3/02 ,  C08F2/00 ,  C08F297/02 ,  C09D153/00

CPC classification number: B05D3/046 ,  B05D3/0254 ,  B05D3/0493 ,  C08F2/001 ,  C08F297/026 ,  C09D153/00 ,  G03F1/68 ,  G03F7/00 ,  G03F7/0002 ,  C08L25/06

Abstract: The present invention relates to a process for controlling the period characterizing the morphology obtained from a blend of block copolymers and of (co)polymers of one of the blocks on a surface employing a particular way of carrying out the synthesis of the blend of block copolymers and of (co)polymers of one of the blocks.

Abstract translation: 本发明涉及一种用于控制表面形貌的时期的方法，其特征在于使用嵌段共聚物的共混物和表面上的一个嵌段的（共））聚合物，其特征在于使用特定的方式进行嵌段共聚物的共混物 和其中一个嵌段的（共）聚合物。

公开(公告)号：US09976053B2

公开(公告)日：2018-05-22

申请号：US15317803

申请日：2015-06-01

Applicant: Arkema France

Inventor： Christophe Navarro ,  Celia Nicolet ,  Xavier Chevalier

IPC: G03F7/00 ,  C08L53/00 ,  C09D153/00 ,  C08F297/02 ,  B05D1/00

CPC classification number: C09D153/00 ,  B05D1/005 ,  B82Y30/00 ,  B82Y40/00 ,  C08F297/026 ,  C08J5/18 ,  C08J2325/08 ,  C08J2333/08 ,  C08L53/00 ,  G03F7/0002

Abstract: The invention relates to a block copolymer film nanostructured into nanodomains, obtained from a base block copolymer having a molecular weight of greater than 50 kg/mol, and preferably greater than 100 kg/mol and less than 250 kg/mol, and at least one block of which comprises styrene, and at least one other block of which comprises methyl methacrylate. This film is characterized in that the styrene-based block is formed by a copolymer of styrene and diphenylethylene (DPE).

公开(公告)号：US20170197204A1

公开(公告)日：2017-07-13

申请号：US15314803

申请日：2015-06-01

Applicant: Arkema France

Inventor： Xavier Chevalier ,  Christophe NAVARRO ,  Celia COLET

IPC: B01J39/20 ,  B01J39/07 ,  C08G85/00 ,  B01J47/02 ,  C08F6/02 ,  B01D15/36 ,  B01J39/26

CPC classification number: B01J39/20 ,  B01D15/362 ,  B01J39/05 ,  B01J39/07 ,  B01J39/26 ,  B01J47/02 ,  C08F6/02 ,  C08G85/002 ,  C08J5/2287 ,  C08J11/02 ,  C08L53/00 ,  C08L33/12

Abstract: The invention relates to a method for eliminating metal ions from a viscous organic solution, the viscosity of which at 20° C. is between 1 and 1000 cP. This method comprises the steps consisting in placing a macroporous ion-exchange resin in a column, said resin comprising at least one acid resin of carboxylic type, based on a copolymer having active groups in carboxylic form (CO2H), then in continuously passing said viscous organic solution over said ion-exchange resin.