Invention Application
- Patent Title: A SULPHUR ADDITIVE TO SUPPRESS HYDROGEN SULPHIDE EMISSIONS FROM SULPHUR EXTENDED ASPHALT
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Application No.: US15560672Application Date: 2016-03-22
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Publication No.: US20180105694A1Publication Date: 2018-04-19
- Inventor: Raksh Vir Jasra , Yogesh Suresh Niwate , Kalpana Gopalakrishnan , Satish Kumar , Prakash Kumar , Lintoan John , Mayur Navinchandra Talati , Nagarathinam Shenbaga Murthy , Ravishankar Vishvasrao Desai
- Applicant: Reliance Industries Limited
- Applicant Address: IN Mumbai
- Assignee: Reliance Industries Limited
- Current Assignee: Reliance Industries Limited
- Current Assignee Address: IN Mumbai
- Priority: IN1000/MUM/2015 20150325
- International Application: PCT/IB2016/051597 WO 20160322
- Main IPC: C08L95/00
- IPC: C08L95/00 ; E01C7/26 ; C01B17/16

Abstract:
The present disclosure relates to a sulphur additive to suppress hydrogen sulphide emissions from Sulphur Extended Asphalt. The sulphur additive of the present disclosure comprises 5 sulphur in an amount ranging from 80 to 98 wt % and at least one aluminosilicate in an amount ranging from 2 to 20 wt %. The sulphur additive of the present disclosure suppresses the H2S emission up to acceptable safe limit during the preparation and application of the sulphur extended asphalt at elevated temperature.
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