Invention Application
- Patent Title: Method for Coating a Substrate and Metal Alloy Vacuum Deposition Facility
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Application No.: US15851154Application Date: 2017-12-21
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Publication No.: US20180112305A1Publication Date: 2018-04-26
- Inventor: Patrick Choquet , Eric Silberberg , Bruno Schmitz , Daniel Chaleix
- Applicant: ArcelorMittal
- Priority: EP07290342.0 20070320
- Main IPC: C23C16/06
- IPC: C23C16/06 ; C23C14/56 ; C23C14/16 ; C23C14/24 ; C23C16/455

Abstract:
A vacuum deposition facility for continuously depositing coatings formed from metal alloys having at least two metallic elements on a running substrate is provided. The vacuum deposition facility includes a vacuum deposition chamber, a substrate running through the vacuum deposition chamber and an evaporation crucible inside the vacuum deposition chamber. The evaporation crucible includes a heater and a bath of molten metal alloy which has at least two metallic elements in a predetermined and constant ratio. The evaporation crucible evaporates the molten metal alloy into a vapor. The vacuum deposition facility also includes a coater inside the vacuum deposition chamber and connected to the evaporation crucible. The coater sprays a face of the running substrate with the vapor at a sonic velocity in order to deposit a coating on the running substrate. The vapor includes the at least two metallic elements in the predetermined and constant ratio.
Information query
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