Vacuum deposition facility and method for coating a substrate with transverse repartition chamber

    公开(公告)号:US12129542B2

    公开(公告)日:2024-10-29

    申请号:US16972176

    申请日:2019-06-11

    Applicant: ArcelorMittal

    CPC classification number: C23C14/562 C23C14/243

    Abstract: A vacuum deposition facility 1 for continuously depositing, on a running substrate S, coatings formed from metal or metal alloy, the facility including an evaporation crucible 4 suited to supply metal or metal alloy vapor and including an evaporation pipe 7, a deposition chamber 2 suited to have the substrate S run through along a given path P and a vapor jet coater 3 linking the evaporation pipe to the deposition chamber, wherein the vapor jet coater further includes a repartition chamber 31 including at least one reheater 33 positioned within the repartition chamber and a vapor outlet orifice 32 including a base opening linking the vapor outlet orifice to the repartition chamber, a top opening through which the vapor can exit in the deposition chamber and two sides converging toward each other in the direction of the top opening.

    Equipment for coating a metal strip

    公开(公告)号:US11313023B2

    公开(公告)日:2022-04-26

    申请号:US16058009

    申请日:2018-08-08

    Applicant: ArcelorMittal

    Abstract: Equipment for manufacturing a metal strip coated by a process that includes vacuum-depositing a layer of an oxidizable metal or an oxidizable metal alloy on a metal strip precoated with zinc or with a zinc alloy, then coiling the coated metal strip, then oxidizing a surface of the metal strip coated with the oxidizable metal or oxidizable metal alloy and treating the oxidized wound coil with a static diffusion treatment to obtain a strip having a coating that includes, in an upper portion, a layer of an alloy formed by diffusion of the oxidizable metal or the oxidizable metal alloy in all or part of the zinc or zinc alloy layer. The equipment includes a device for galvanizing the metal strip, a vacuum deposition coating device, and a static heat treatment device operating in a controlled atmosphere.

    Method for Coating a Substrate and Metal Alloy Vacuum Deposition Facility

    公开(公告)号:US20180112305A1

    公开(公告)日:2018-04-26

    申请号:US15851154

    申请日:2017-12-21

    Applicant: ArcelorMittal

    Abstract: A vacuum deposition facility for continuously depositing coatings formed from metal alloys having at least two metallic elements on a running substrate is provided. The vacuum deposition facility includes a vacuum deposition chamber, a substrate running through the vacuum deposition chamber and an evaporation crucible inside the vacuum deposition chamber. The evaporation crucible includes a heater and a bath of molten metal alloy which has at least two metallic elements in a predetermined and constant ratio. The evaporation crucible evaporates the molten metal alloy into a vapor. The vacuum deposition facility also includes a coater inside the vacuum deposition chamber and connected to the evaporation crucible. The coater sprays a face of the running substrate with the vapor at a sonic velocity in order to deposit a coating on the running substrate. The vapor includes the at least two metallic elements in the predetermined and constant ratio.

    Vacuum deposition facility and method for coating a substrate

    公开(公告)号:US12054821B2

    公开(公告)日:2024-08-06

    申请号:US16770850

    申请日:2018-12-11

    Applicant: ArcelorMittal

    CPC classification number: C23C14/24 C23C14/14 C23C14/562 C23C14/564

    Abstract: A vacuum deposition facility for continuously depositing, on a running substrate, coatings formed from metal or metal alloy, the facility including—a vacuum chamber and a device for running the substrate through the vacuum chamber along a given path, wherein the vacuum chamber further includes:



    a central casing including a substrate entry and a substrate exit located on two opposite sides of the central casing and a vapor jet coater, the inner walls of the central casing being suited to be heated at a temperature above the condensation temperature of the metal or metal alloy vapors,
    a vapor trap in the form of an external casing located at the substrate exit of the central casing, the inner walls of the vapor trap being suited to be maintained at a temperature below the condensation temperature of the metal or metal alloy vapors.

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