公开(公告)号：US20180112305A1

公开(公告)日：2018-04-26

申请号：US15851154

申请日：2017-12-21

Applicant: ArcelorMittal

Inventor： Patrick Choquet ,  Eric Silberberg ,  Bruno Schmitz ,  Daniel Chaleix

IPC: C23C16/06 ,  C23C14/56 ,  C23C14/16 ,  C23C14/24 ,  C23C16/455

CPC classification number: C23C16/06 ,  C23C14/16 ,  C23C14/24 ,  C23C14/562 ,  C23C16/45563

Abstract: A vacuum deposition facility for continuously depositing coatings formed from metal alloys having at least two metallic elements on a running substrate is provided. The vacuum deposition facility includes a vacuum deposition chamber, a substrate running through the vacuum deposition chamber and an evaporation crucible inside the vacuum deposition chamber. The evaporation crucible includes a heater and a bath of molten metal alloy which has at least two metallic elements in a predetermined and constant ratio. The evaporation crucible evaporates the molten metal alloy into a vapor. The vacuum deposition facility also includes a coater inside the vacuum deposition chamber and connected to the evaporation crucible. The coater sprays a face of the running substrate with the vapor at a sonic velocity in order to deposit a coating on the running substrate. The vapor includes the at least two metallic elements in the predetermined and constant ratio.