Invention Application
- Patent Title: POLYETHYLENE FILM
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Application No.: US15561855Application Date: 2016-03-22
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Publication No.: US20180117890A1Publication Date: 2018-05-03
- Inventor: Wakato Tomatsu , Hirokazu Ogi , Akira Matsuda
- Applicant: TOYOBO CO., LTD.
- Applicant Address: JP Osaka-shi, Osaka
- Assignee: TOYOBO CO., LTD.
- Current Assignee: TOYOBO CO., LTD.
- Current Assignee Address: JP Osaka-shi, Osaka
- Priority: JP2015-064722 20150326
- International Application: PCT/JP2016/058930 WO 20160322
- Main IPC: B32B27/32
- IPC: B32B27/32 ; B29C47/00 ; B32B27/08 ; C08J5/18 ; C08L23/06

Abstract:
Provided is a polyethylene film showing more excellent blocking resistance in unwinding from the film roll state and more excellent blocking resistance between sealants after lamination with a base material, and having transparency and excellent heat sealing property even at low temperatures. A polyethylene film wherein in at least either face, a ratio between an arithmetic mean roughness in a machine direction of film (Ra(MD)), and an arithmetic mean roughness in a direction perpendicular to the machine direction (Ra(TD)) satisfies the following formula (1): 1.2≤Ra(TD)/Ra(MD)≤3.6 (1) (Ra(MD): arithmetic mean roughness [μm] measured in the machine direction of film, and Ra(TD): arithmetic mean roughness [μm] measured in the direction perpendicular to the machine direction of film).
Public/Granted literature
- US10556409B2 Polyethylene film Public/Granted day:2020-02-11
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