- 专利标题： MATERIALS AND METHODS FOR CONDUCTIVE THIN FILMS
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申请号： US15846493申请日： 2017-12-19
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公开(公告)号： US20180118960A1公开(公告)日： 2018-05-03
- 发明人: Mahshid Sam , Rustom B. Bhiladvala
- 申请人： Quirklogic, Inc.
- 主分类号： C09D7/40
- IPC分类号： C09D7/40 ; C09D5/24 ; C09D101/12 ; C09D101/28 ; C09D123/02 ; C09D133/02
摘要：
A material composition for manufacturing a translucent conductive film includes a fluid. The material composition further includes nanostructures disposed within the fluid. The material composition further includes a component that modifies a structure of a joint formed between at least two nanostructures of the plurality of nanostructures after the component is activated. The component may be activated by applying heath or optical radiation to the component.
公开/授权文献
- US11111399B2 Materials and methods for conductive thin films 公开/授权日：2021-09-07
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