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Invention Application
US20180164677A1 PHOTOMASK, LAMINATE COMPRISING PHOTOMASK, PHOTOMASK PREPARATION METHOD, AND PATTERN FORMING METHOD USING PHOTOMASK 审中-公开

  • Patent Title: PHOTOMASK, LAMINATE COMPRISING PHOTOMASK, PHOTOMASK PREPARATION METHOD, AND PATTERN FORMING METHOD USING PHOTOMASK
  • Application No.: US15580241
    Application Date: 2016-07-28
  • Publication No.: US20180164677A1
    Publication Date: 2018-06-14
  • Inventor: Yong Goo SON , Kiseok LEE , Seung Heon LEE
  • Applicant: LG CHEM, LTD.
  • Priority: KR10-2015-0106833 20150728
  • International Application: PCT/KR2016/008299 WO 20160728
  • Main IPC: G03F1/48
  • IPC: G03F1/48
PHOTOMASK, LAMINATE COMPRISING PHOTOMASK, PHOTOMASK PREPARATION METHOD, AND PATTERN FORMING METHOD USING PHOTOMASK
Abstract:
The present specification relates to a photomask, a laminate including the photomask, a method for manufacturing the photomask and a method for forming a pattern using the photomask.
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