The disclosed technology generally relates to semiconductor memory devices, and more particularly to a static random access memory (SRAM) device. One aspect of the disclosed technology is a bit cell for a static random access memory (SRAM) comprising: a first and a second vertical stack of transistors arranged on a substrate. Each stack includes a pull-up transistor, a pull-down transistor and a pass transistor, each transistor including a horizontally extending channel, the pull-up transistor and the pull-down transistor having a common gate electrode extending vertically between the pull-up transistor and the pull-down transistor and the pass transistor having a gate electrode being separate from the common gate electrode. A source/drain of the pull-up transistor and of the pull-down transistor of the first stack, a source/drain of the pass transistor of the first stack and the common gate electrode of the pull-up and pull-down transistors of the second stack are electrically interconnected. A source/drain of the pull-up transistor and of the pull-down transistor of the second stack, a source/drain of the pass transistor of the second stack and the common gate electrode of the pull-up and pull-down transistors of the first stack are electrically interconnected.