- 专利标题: SEMICONDUCTOR MEMORY DEVICE AND METHOD FOR MANUFACTURING THE SAME
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申请号: US15967930申请日: 2018-05-01
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公开(公告)号: US20180254279A1公开(公告)日: 2018-09-06
- 发明人: Naoki Yasuda
- 申请人: Toshiba Memory Corporation
- 申请人地址: JP Minato-ku
- 专利权人: Toshiba Memory Corporation
- 当前专利权人: Toshiba Memory Corporation
- 当前专利权人地址: JP Minato-ku
- 主分类号: H01L27/1157
- IPC分类号: H01L27/1157 ; H01L29/10 ; H01L29/423 ; H01L27/11582 ; H01L29/51 ; H01L27/11565 ; H01L21/02 ; H01L21/28
摘要:
According to one embodiment, a semiconductor memory device includes a stacked body including a plurality of electrode members and a plurality of insulating members, each of the electrode members and each of the insulating members being stacked alternately in a first direction on the substrate. The semiconductor memory device also includes a memory hole that extends in the stacked body in the first direction and a semiconductor member that is disposed to extend in the memory hole in the first direction. The semiconductor memory device also includes a memory member that is disposed between the semiconductor member and the plurality of electrode members. The plurality of electrode members including a first electrode member and a second electrode member, a thickness of the memory member at the position of the first electrode member being greater than a thickness of the memory member at the position of the second electrode member.
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