Invention Application
- Patent Title: METHOD OF REDUCING EFFECTS OF RETICLE HEATING AND/OR COOLING IN A LITHOGRAPHIC PROCESS
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Application No.: US15760629Application Date: 2016-08-26
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Publication No.: US20180259859A1Publication Date: 2018-09-13
- Inventor: Nick KANT , Mark Jan Hendrik LUTTIKHOF
- Applicant: ASML NETHERLANDS B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML NETHERLANDS B.V
- Current Assignee: ASML NETHERLANDS B.V
- Current Assignee Address: NL Veldhoven
- Priority: EP15186673.8 20150924; EP15196964.9 20151130; EP16170061.2 20160518
- International Application: PCT/EP2016/070157 WO 20160826
- Main IPC: G03F7/20
- IPC: G03F7/20
Abstract:
A method of reducing effects of reticle heating and/or cooling in a lithographic process, the method including calibrating a linear time invariant reticle heating model using a system identification method; predicting distortions of the reticle using the reticle heating model and inputs in the lithographic process; and calculating and applying a correction in the lithographic process on the basis of the predicted distortions of the reticle.
Public/Granted literature
- US10429749B2 Method of reducing effects of reticle heating and/or cooling in a lithographic process Public/Granted day:2019-10-01
Information query
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