公开(公告)号：US20180259859A1

公开(公告)日：2018-09-13

申请号：US15760629

申请日：2016-08-26

Applicant: ASML NETHERLANDS B.V.

Inventor： Nick KANT ,  Mark Jan Hendrik LUTTIKHOF

IPC: G03F7/20

CPC classification number: G03F7/70875 ,  G03F7/705 ,  G03F7/70516 ,  G03F7/70783

Abstract: A method of reducing effects of reticle heating and/or cooling in a lithographic process, the method including calibrating a linear time invariant reticle heating model using a system identification method; predicting distortions of the reticle using the reticle heating model and inputs in the lithographic process; and calculating and applying a correction in the lithographic process on the basis of the predicted distortions of the reticle.

公开(公告)号：US20190324376A1

公开(公告)日：2019-10-24

申请号：US16458601

申请日：2019-07-01

Applicant: ASML NETHERLANDS B.V.

Inventor： Nick KANT ,  Mark Jan Hendrik LUTTIKHOF

IPC: G03F7/20

Abstract: A method of reducing effects of reticle heating and/or cooling in a lithographic process, the method including calibrating a linear time invariant reticle heating model using a system identification method; predicting distortions of the reticle using the reticle heating model and inputs in the lithographic process; and calculating and applying a correction in the lithographic process on the basis of the predicted distortions of the reticle.