- 专利标题: SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME
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申请号: US15994303申请日: 2018-05-31
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公开(公告)号: US20180286986A1公开(公告)日: 2018-10-04
- 发明人: Junichiro SAKATA , Takuya HIROHASHI , Hideyuki KISHIDA
- 申请人: Semiconductor Energy Laboratory Co., Ltd.
- 优先权: JP2009-053399 20090306
- 主分类号: H01L29/786
- IPC分类号: H01L29/786 ; H01L29/66 ; H01L29/49 ; H01L29/423 ; H01L29/417 ; H01L29/24 ; H01L29/10 ; H01L29/08 ; H01L27/12 ; H01L21/02
摘要:
It is an object to provide a highly reliable semiconductor device including a thin film transistor with stable electric characteristics. In a semiconductor device including an inverted staggered thin film transistor whose semiconductor layer is an oxide semiconductor layer, a buffer layer is provided over the oxide semiconductor layer. The buffer layer is in contact with a channel formation region of the semiconductor layer and source and drain electrode layers. A film of the buffer layer has resistance distribution. A region provided over the channel formation region of the semiconductor layer has lower electrical conductivity than the channel formation region of the semiconductor layer, and a region in contact with the source and drain electrode layers has higher electrical conductivity than the channel formation region of the semiconductor layer.
公开/授权文献
- US10236391B2 Semiconductor device and method for manufacturing the same 公开/授权日:2019-03-19
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