- 专利标题: MANUFACTURING METHOD OF GLASS SUBSTRATE AND GLASS SUBSTRATE
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申请号: US15989934申请日: 2018-05-25
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公开(公告)号: US20180339936A1公开(公告)日: 2018-11-29
- 发明人: Motoshi Ono , Mamoru Isobe , Shigetoshi Mori , Kohei Horiuchi
- 申请人: Asahi Glass Company, Limited
- 申请人地址: JP Chiyoda-ku
- 专利权人: Asahi Glass Company, Limited
- 当前专利权人: Asahi Glass Company, Limited
- 当前专利权人地址: JP Chiyoda-ku
- 优先权: JP2017-106007 20170529
- 主分类号: C03C15/00
- IPC分类号: C03C15/00 ; H05K3/00 ; C03C23/00 ; B23K26/00 ; B23K26/382
摘要:
A manufacturing method of a glass substrate having through holes includes (i) irradiating at a through hole forming target position on a first surface of the glass substrate with a laser light; and (ii) performing a wet etching treatment on the glass substrate. During the wet etching treatment being performed on the glass substrate, an ultrasonic vibration with a frequency of less than 40 kHz is applied to an etchant over at least a part of the wet etching period, referred to as an ultrasonic vibration application period.