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公开(公告)号:US20180339936A1
公开(公告)日:2018-11-29
申请号:US15989934
申请日:2018-05-25
发明人: Motoshi Ono , Mamoru Isobe , Shigetoshi Mori , Kohei Horiuchi
IPC分类号: C03C15/00 , H05K3/00 , C03C23/00 , B23K26/00 , B23K26/382
摘要: A manufacturing method of a glass substrate having through holes includes (i) irradiating at a through hole forming target position on a first surface of the glass substrate with a laser light; and (ii) performing a wet etching treatment on the glass substrate. During the wet etching treatment being performed on the glass substrate, an ultrasonic vibration with a frequency of less than 40 kHz is applied to an etchant over at least a part of the wet etching period, referred to as an ultrasonic vibration application period.