- 专利标题: WAVEGUIDE FABRICATION WITH SACRIFICIAL SIDEWALL SPACERS
-
申请号: US15992845申请日: 2018-05-30
-
公开(公告)号: US20180348429A1公开(公告)日: 2018-12-06
- 发明人: Michael Yu-tak YOUNG , Wayne MCMILLAN , Rutger THIJSSEN , Robert Jan VISSER
- 申请人: Applied Materials, Inc.
- 主分类号: G02B6/122
- IPC分类号: G02B6/122 ; G06F3/01 ; G02B27/01
摘要:
Embodiments described herein relate to apparatus and methods for display structure fabrication. In one embodiment, a waveguide structure having an input grating structure and an output grating structure is fabricated and a spacer material is deposited on the waveguide. The spacer material is etched from various portions of the waveguide structure and a high refractive index material is deposited on the waveguide. Portions of the spacer material remaining on the waveguide structure are removed leaving the high refractive index material disposed on desired surfaces of the waveguide structure.
公开/授权文献
- US10409001B2 Waveguide fabrication with sacrificial sidewall spacers 公开/授权日:2019-09-10
信息查询