公开(公告)号：US20220252780A1

公开(公告)日：2022-08-11

申请号：US17730280

申请日：2022-04-27

Applicant: Applied Materials, Inc.

Inventor： Michael Yu-tak YOUNG ,  Wayne MCMILLAN ,  Rutger MEYER TIMMERMAN THIJSSEN ,  Robert Jan VISSER

IPC: F21V8/00 ,  G03F7/00

Abstract: Embodiments described herein relate to methods for fabricating waveguide structures utilizing substrates. The waveguide structures are formed having input coupling regions, waveguide regions, and output coupling regions formed from substrates. The regions are formed by imprinting stamps into resists disposed on hard masks formed on surfaces of the substrates to form positive waveguide patterns. Portions of the positive waveguide patterns and the hard masks formed under the portions are removed. The substrates are masked and etched to form gratings in the input coupling regions and the output coupling regions. Residual portions of the positive waveguide patterns and the hard masks disposed under the residual portions are removed to form waveguide structures having input coupling regions, waveguide regions, and output coupling regions formed from substrates.

公开(公告)号：US20220082738A1

公开(公告)日：2022-03-17

申请号：US17456507

申请日：2021-11-24

Applicant: Applied Materials, Inc.

Inventor： Michael Yu-tak YOUNG ,  Ludovic GODET ,  Robert Jan VISSER ,  Naamah ARGAMAN ,  Christopher Dennis BENCHER ,  Wayne MCMILLAN

IPC: G02B5/18 ,  G02B26/08 ,  G02B30/26

Abstract: Embodiments herein describe a sub-micron 3D diffractive optics element and a method for forming the sub-micron 3D diffractive optics element. In a first embodiment, a method is provided for forming a sub-micron 3D diffractive optics element on a film stack disposed on a substrate without planarization. The method includes forming a hardmask on a top surface of a film stack. Forming a mask material on a portion of the top surface and a portion of the hardmask. Etching the top surface. Trimming the mask. Etching the top surface again. Trimming the mask a second time. Etching the top surface yet again and then stripping the mask material.

公开(公告)号：US20240184024A1

公开(公告)日：2024-06-06

申请号：US18439434

申请日：2024-02-12

Applicant: Applied Materials, Inc.

Inventor： Michael Yu-tak YOUNG ,  Ludovic GODET ,  Robert Jan VISSER ,  Naamah ARGAMAN ,  Christopher Dennis BENCHER ,  Wayne MCMILLAN

IPC: G02B5/18 ,  G02B26/08 ,  G02B30/26 ,  G03F7/00

CPC classification number: G02B5/1842 ,  G02B5/1857 ,  G02B26/0808 ,  G02B30/26 ,  G02B5/1876 ,  G03F7/0037

Abstract: Embodiments herein describe a sub-micron 3D diffractive optics element and a method for forming the sub-micron 3D diffractive optics element. In a first embodiment, a method is provided for forming a sub-micron 3D diffractive optics element on a film stack disposed on a substrate without planarization. The method includes forming a hardmask on a top surface of a film stack. Forming a mask material on a portion of the top surface and a portion of the hardmask. Etching the top surface. Trimming the mask. Etching the top surface again. Trimming the mask a second time. Etching the top surface yet again and then stripping the mask material.

公开(公告)号：US20180348522A1

公开(公告)日：2018-12-06

申请号：US15992831

申请日：2018-05-30

Applicant: Applied Materials, Inc.

Inventor： Michael Yu-tak YOUNG ,  Wayne MCMILLAN ,  Rutger THIJSSEN ,  Robert Jan VISSER

IPC: G02B27/01 ,  F21V8/00

Abstract: Embodiments described herein relate to a waveguide imaging structure. The waveguide imaging structure generally includes an input coupling region, a waveguide region, and an output coupling region. In certain embodiments, a photochromic material layer is disposed on an output coupling region of the imaging structure. Also described herein are methods and materials for forming the photochromic material layer.

公开(公告)号：US20200301062A1

公开(公告)日：2020-09-24

申请号：US16762869

申请日：2018-11-13

Applicant: Applied Materials, Inc.

Inventor： Michael Yu-tak YOUNG ,  Wayne MCMILLAN ,  Rutger MEYER TIMMERMAN THIJSSEN ,  Robert Jan VISSER

IPC: F21V8/00 ,  G03F7/00

Abstract: Embodiments described herein relate to methods for fabricating waveguide structures utilizing substrates. The waveguide structures are formed having input coupling regions, waveguide regions, and output coupling regions formed from substrates. The regions are formed by imprinting stamps into resists disposed on hard masks formed on surfaces of the substrates to form positive waveguide patterns. Portions of the positive waveguide patterns and the hard masks formed under the portions are removed. The substrates are masked and etched to form gratings in the input coupling regions and the output coupling regions. Residual portions of the positive waveguide patterns and the hard masks disposed under the residual portions are removed to form waveguide structures having input coupling regions, waveguide regions, and output coupling regions formed from substrates.

公开(公告)号：US20190278005A1

公开(公告)日：2019-09-12

申请号：US16293354

申请日：2019-03-05

Applicant: Applied Materials, Inc.

Inventor： Michael Yu-tak YOUNG ,  Ludovic GODET ,  Robert Jan VISSER ,  Naamah ARGAMAN ,  Christopher Dennis BENCHER ,  Wayne MCMILLAN

IPC: G02B5/18 ,  G02B26/08 ,  G02B27/22

Abstract: Embodiments herein describe a sub-micron 3D diffractive optics element and a method for forming the sub-micron 3D diffractive optics element. In a first embodiment, a method is provided for forming a sub-micron 3D diffractive optics element on a substrate without planarization. The method includes depositing a material stack to be patterned on a substrate, depositing and patterning a thick mask material on a portion of the material stack, etching the material stack down one level, trimming a side portion of the thick mask material, etching the material stack down one more level, repeating trim and etch steps above ‘n’ times, and stripping the thick mask material from the material stack.

公开(公告)号：US20180348429A1

公开(公告)日：2018-12-06

申请号：US15992845

申请日：2018-05-30

Applicant: Applied Materials, Inc.

Inventor： Michael Yu-tak YOUNG ,  Wayne MCMILLAN ,  Rutger THIJSSEN ,  Robert Jan VISSER

IPC: G02B6/122 ,  G06F3/01 ,  G02B27/01

CPC classification number: G02B6/1223 ,  G02B27/0172 ,  G02B2006/12038 ,  G02B2006/12107 ,  G02B2006/12176 ,  G06F3/011

Abstract: Embodiments described herein relate to apparatus and methods for display structure fabrication. In one embodiment, a waveguide structure having an input grating structure and an output grating structure is fabricated and a spacer material is deposited on the waveguide. The spacer material is etched from various portions of the waveguide structure and a high refractive index material is deposited on the waveguide. Portions of the spacer material remaining on the waveguide structure are removed leaving the high refractive index material disposed on desired surfaces of the waveguide structure.