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公开(公告)号:US20180348429A1
公开(公告)日:2018-12-06
申请号:US15992845
申请日:2018-05-30
Applicant: Applied Materials, Inc.
Inventor: Michael Yu-tak YOUNG , Wayne MCMILLAN , Rutger THIJSSEN , Robert Jan VISSER
CPC classification number: G02B6/1223 , G02B27/0172 , G02B2006/12038 , G02B2006/12107 , G02B2006/12176 , G06F3/011
Abstract: Embodiments described herein relate to apparatus and methods for display structure fabrication. In one embodiment, a waveguide structure having an input grating structure and an output grating structure is fabricated and a spacer material is deposited on the waveguide. The spacer material is etched from various portions of the waveguide structure and a high refractive index material is deposited on the waveguide. Portions of the spacer material remaining on the waveguide structure are removed leaving the high refractive index material disposed on desired surfaces of the waveguide structure.
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公开(公告)号:US20180348522A1
公开(公告)日:2018-12-06
申请号:US15992831
申请日:2018-05-30
Applicant: Applied Materials, Inc.
Inventor: Michael Yu-tak YOUNG , Wayne MCMILLAN , Rutger THIJSSEN , Robert Jan VISSER
Abstract: Embodiments described herein relate to a waveguide imaging structure. The waveguide imaging structure generally includes an input coupling region, a waveguide region, and an output coupling region. In certain embodiments, a photochromic material layer is disposed on an output coupling region of the imaging structure. Also described herein are methods and materials for forming the photochromic material layer.
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